Towards understanding the difference in ultraviolet, ns-laser damage resistance between hafnia films produced by electron beam evaporation and ion beam sputtering methods
已取消10由 dzz 发布于 2025/3/27 17:30:26
DOI:10.1117/12.2572814
作者:V. Peters, S. Qiu, C. Harthcock, R. Negres, T. Voisin, E. Feigenbaum, G. Guss, C. Stolz, Mengbing Huang
文献类型:期刊论文
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International Society for Optics and Photonics (SPIE)