Etch and deposition co-optimization: a pathway to enabling high aspect ratio 3D NAND Flash ONON channel hole patterning
已取消20由 居鸭 发布于 2025/9/3 19:20:16
DOI:10.1117/12.2582627
作者:Meihua Shen, J. Hoang, Chiu-Wei Hao, Danna Qian, G. Papasouliotis, Jonathan Church, P. Subramonium, E. Hudson, Leonid Belau, K. Haynes, M. Weimer, Puthenkovilakam Ragesh, Sirish K. Reddy, Sonal Bhadau
文献类型:期刊论文
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International Society for Optics and Photonics (SPIE)