Challenges and opportunities of KrF photoresist development for 3D NAND application
已完结20由 yml 发布于 2025/7/21 9:35:24
DOI:10.1117/12.2552140
作者:Yang Song, Mingqi Li, J. Park, Xisen Hou, Y. Matsuda, Cong Liu, E. Aqad, Janet R. Wu, Huan He, Huiying Liu, P. Baranowski, C. Xu
文献类型:期刊论文
补充材料:只需要正文
International Society for Optics and Photonics (SPIE)