Efficient access to non-damaging GaN (0001) by inductively coupled plasma etching and chemical–mechanical polishing
待确认10由 张 发布于 2025/12/22 18:17:41
DOI:10.1016/j.apsusc.2024.161207
作者:Qiubo Li , Shouzhi Wang , Lei Liu , Kepeng Song , Jiaoxian Yu , Guodong Wang , Jingliang Liu , Peng Cui , Siheng Chen , Defu Sun , Zhongxin Wang ,&nbs
文献类型:期刊论文
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