2006 International Workshop on Junction Technology

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Shallow junctions in silicon via low thermal budget processing

Pub Date : 2006-08-14 DOI: 10.1109/IWJT.2006.220850 B. Sealy, A.J. Smith, T. Alzanki, N. Bennett, L. Li, C. Jeynes, B. Colombeau, E. Collart, N. Emerson, R. Gwilliam, N. Cowern

Control of both number and position of dopant atoms in semiconductors by single ion implantation

Pub Date : 2006-08-14 DOI: 10.1109/IWJT.2006.220851 T. Shinada, T. Kurosawa, T. Kobayashi, H. Nakayama, I. Ohdomari

A Study of Nickel Silicide Formed on SOI Substrate with Different Ni/Co Thicknesses for Nano-scale CMOSFET

Pub Date : 2006-08-14 DOI: 10.1109/IWJT.2006.220887 Soon-Yen Jung, Soon-Young Oh, Yong-Jin Kim, Won-Jae Lee, Ying-Ying Zhang, Z. Zhong, H. Lee

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