Design and Evaluation of Molecularly Imprinted Nanoparticles for Oxolinic Acid Photodegradation

IF 5.2 2区 化学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY ACS Applied Polymer Materials Pub Date : 2026-10-09 Epub Date: 2026-09-17 DOI:10.1021/acsapm.6c02276
Yadiris García, Myleidi Vera, Duván González, Estefanía Vélez-Peña, Börje Sellergren, Verónica A. Jiménez
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引用次数: 0

Abstract

Molecularly imprinted polymers have evolved into versatile functional platforms that extend far beyond traditional separation science applications. This work reports the development of photoactive molecularly imprinted nanoparticles (MINs) for the capture and photocatalytic degradation of the recalcitrant antibiotic pollutant oxolinic acid (OA) under visible-light irradiation. Molecular dynamics simulations were used to screen eight monomer formulations with varying ratios of (AA), N-isopropylacrylamide (NIPAm), N-tert-butylacrylamide (TBAm), N-(3-aminopropyl)methacrylamide hydrochloride (APMA), and the crosslinker N,N′-methylenebis(acrylamide) (BIS). The computational formulation with the highest affinity to the template (40% AA, 8% NIPAm, 8% TBAm, 39% APMA, and 5% BIS) guided the synthesis of OA-imprinted MINs via high-dilution polymerization in aqueous solution, followed by in situ conjugation with the photosensitizer toluidine blue O (TBO) via EDC/NHS coupling. Dynamic light scattering, zeta potential, and TEM experiments confirmed the nanoscale size and colloidal stability of the synthesized nanoparticles. Photoactive MINs achieved 20% OA binding capacity at 50 μmol L–1 and sustained singlet oxygen generation under white LED light irradiation (150 mW cm–2) for 1 h. Immobilized MINs were tested as photocatalysts for OA degradation at 100 and 200 μmol L–1, achieving 60–80% antibiotic removal after 6 h of irradiation. 1H-NMR of OA at an early degradation point suggests a possible fragmentation pathway involving dealkylation of the γ-pyridone-β-carboxylic ring. OA degradation at concentrations exceeding the MINs binding capacity confirmed that the photocatalytic removal operates through a cavity-assisted mechanism comprising substrate capture, photochemical degradation, and product release. Despite the long irradiation times required for OA degradation, our results show the potential of integrating molecular imprinting and photosensitization to develop polymeric photocatalysts for antibiotic remediation.

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氧喹啉酸光降解分子印迹纳米颗粒的设计与评价
分子印迹聚合物已经发展成为多功能的功能平台,远远超出了传统的分离科学应用。本文报道了光活性分子印迹纳米颗粒(MINs)在可见光照射下捕获和光催化降解顽固性抗生素污染物氧喹啉酸(OA)的进展。采用分子动力学模拟筛选了8种不同配比的单体配方,分别为(AA)、N-异丙基丙烯酰胺(NIPAm)、N-叔丁基丙烯酰胺(tham)、N-(3-氨基丙基)甲基丙烯酰胺盐渍剂(APMA)和交联剂N,N ' -亚甲基双丙烯酰胺(BIS)。对模板亲和力最高的计算公式(40% AA, 8% NIPAm, 8% tam, 39% APMA和5% BIS)指导通过水溶液中高稀释聚合合成oa印迹的min,然后通过EDC/NHS偶联与光敏剂甲苯胺蓝O (TBO)原位偶联。动态光散射、zeta电位和透射电镜实验证实了合成的纳米颗粒的纳米级尺寸和胶体稳定性。光活性min在50 μmol - 1的条件下达到20%的OA结合能力,在白光LED光(150mw cm-2)照射下持续产生单重态氧1h。在100和200 μmol L-1的光照条件下,固定化min作为OA降解光催化剂,照射6 h后抗生素去除率达到60 - 80%。oa在早期降解点的1H-NMR表明可能的裂解途径涉及γ-吡啶酮-β-羧化脱烷基。浓度超过min结合能力的OA降解证实了光催化去除是通过一个由底物捕获、光化学降解和产物释放组成的腔辅助机制进行的。尽管OA降解需要较长的照射时间,但我们的研究结果表明,将分子印迹和光敏化结合起来开发用于抗生素修复的聚合光催化剂具有潜力。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
CiteScore
7.20
自引率
6.00%
发文量
810
期刊介绍: ACS Applied Polymer Materials is an interdisciplinary journal publishing original research covering all aspects of engineering, chemistry, physics, and biology relevant to applications of polymers. The journal is devoted to reports of new and original experimental and theoretical research of an applied nature that integrates fundamental knowledge in the areas of materials, engineering, physics, bioscience, polymer science and chemistry into important polymer applications. The journal is specifically interested in work that addresses relationships among structure, processing, morphology, chemistry, properties, and function as well as work that provide insights into mechanisms critical to the performance of the polymer for applications.
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