1999 4th International Symposium on Plasma Process-Induced Damage (IEEE Cat. No.99TH8395)

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1999 4th International Symposium on Plasma Process-Induced Damage (IEEE Cat. No.99TH8395) - 最新文献

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Effect of low temperature deuterium annealing on plasma process induced damage

Pub Date : 1999-12-01 DOI: 10.1109/PPID.1999.798845 S.H. Lee, Y. Kim, Y. Lee, H. Kang, C. Ahn, B. Kang, Jinju Lee, K. Cheng, Zhi Chen, K. Hess, J. Lyding

Fast hot-carrier aging method of charging damage measurement

Pub Date : 1999-05-09 DOI: 10.1109/PPID.1999.798850 K.P. Cheung, E. J. Lloyd

Suppression of topography dependent charging using a phase-controlled pulsed inductively coupled plasma

Pub Date : 1999-05-09 DOI: 10.1109/PPID.1999.798837 K. Shin, W. Park, Ji-Soo Kim, C. Kang, T. Ahn, J. Moon, Moonyong Lee

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