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Fabrication of Anodic Aluminum Oxide and Cu Electrode and Improvement of Its Mechanical and Electrical Properties 阳极氧化铝和铜电极的制备及其机电性能的改善
IF 2.6 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2025-07-24 DOI: 10.1007/s13391-025-00584-6
Chae Yoon Kim, Min-Jeong Lee, Eun Soo Shim, Se Rin Park, Jae-Hong Lim

The increasing demand for miniaturized and high-performance integrated circuits requires efficient interposer technologies for advanced semiconductor packaging. In this study, anodic aluminum oxide (AAO) was investigated as a potential interposer substrate owing to its excellent electrical insulation and low dielectric constant. A Pd-TiO2 ink catalyst was applied to enhance the dielectric performance while suppressing copper ion penetration during the electroless Cu deposition. Compared to conventional Sn-Pd catalysts, the application of Pd-TiO2 improved the dielectric stability and interfacial reliability. Subsequent Cu electroplating using nitrotetrazolium blue chloride (NTBC) as a leveling additive enabled uniform, void-free through-hole filling while minimizing surface overplating, and demonstrated improved void suppression compared to conventional multi-additive systems. Morphological and electrical characterizations confirmed the effectiveness of this single-additive method. This integrated approach combining Pd-TiO2 catalysis and NTBC-assisted plating demonstrates a viable route toward AAO-based interposers with enhanced dielectric and metallization properties. These findings support the feasibility of using AAO substrates for next-generation semiconductor packages that require high signal integrity and thermal reliability.

Graphical Abstract

Comparison of catalyst and additive effects on copper filling in AAO interposers. OM images of Cu deposition using a commercial Sn-Pd catalyst, b Pd-TiO2 catalyst, c NTBC-based single-additive filling after 64 h, and d three-additive filling after 9 h.

对小型化和高性能集成电路的需求日益增长,需要高效的中间层技术来实现先进的半导体封装。在本研究中,阳极氧化铝(AAO)由于其优异的电绝缘性和低介电常数而被研究作为潜在的中间层衬底。在化学镀铜过程中,采用Pd-TiO2墨水催化剂提高了介质性能,同时抑制了铜离子的渗透。与传统的Sn-Pd催化剂相比,Pd-TiO2的应用提高了催化剂的介电稳定性和界面可靠性。随后使用硝基四氮唑蓝氯化钠(NTBC)作为调平添加剂电镀Cu,可以实现均匀、无空洞的通孔填充,同时最大限度地减少表面复镀,并且与传统的多添加剂系统相比,可以更好地抑制空洞。形态学和电学表征证实了这种单加性方法的有效性。这种将Pd-TiO2催化和nbc辅助镀相结合的方法证明了制备具有增强介电和金属化性能的aao基中间体的可行途径。这些发现支持了将AAO基板用于需要高信号完整性和热可靠性的下一代半导体封装的可行性。图解摘要AAO中间体中催化剂与添加剂对铜填充效果的比较。使用商业Sn-Pd催化剂、b Pd-TiO2催化剂、c ntbc基单添加剂填充64 h、d三添加剂填充9 h沉积Cu的OM图像。
{"title":"Fabrication of Anodic Aluminum Oxide and Cu Electrode and Improvement of Its Mechanical and Electrical Properties","authors":"Chae Yoon Kim,&nbsp;Min-Jeong Lee,&nbsp;Eun Soo Shim,&nbsp;Se Rin Park,&nbsp;Jae-Hong Lim","doi":"10.1007/s13391-025-00584-6","DOIUrl":"10.1007/s13391-025-00584-6","url":null,"abstract":"<div><p>The increasing demand for miniaturized and high-performance integrated circuits requires efficient interposer technologies for advanced semiconductor packaging. In this study, anodic aluminum oxide (AAO) was investigated as a potential interposer substrate owing to its excellent electrical insulation and low dielectric constant. A Pd-TiO<sub>2</sub> ink catalyst was applied to enhance the dielectric performance while suppressing copper ion penetration during the electroless Cu deposition. Compared to conventional Sn-Pd catalysts, the application of Pd-TiO<sub>2</sub> improved the dielectric stability and interfacial reliability. Subsequent Cu electroplating using nitrotetrazolium blue chloride (NTBC) as a leveling additive enabled uniform, void-free through-hole filling while minimizing surface overplating, and demonstrated improved void suppression compared to conventional multi-additive systems. Morphological and electrical characterizations confirmed the effectiveness of this single-additive method. This integrated approach combining Pd-TiO<sub>2</sub> catalysis and NTBC-assisted plating demonstrates a viable route toward AAO-based interposers with enhanced dielectric and metallization properties. These findings support the feasibility of using AAO substrates for next-generation semiconductor packages that require high signal integrity and thermal reliability.</p><h3>Graphical Abstract</h3>\u0000<div><figure><div><div><picture><source><img></source></picture></div><div><p>Comparison of catalyst and additive effects on copper filling in AAO interposers. OM images of Cu deposition using <b>a</b> commercial Sn-Pd catalyst, <b>b</b> Pd-TiO<sub>2</sub> catalyst, <b>c</b> NTBC-based single-additive filling after 64 h, and <b>d</b> three-additive filling after 9 h.</p></div></div></figure></div></div>","PeriodicalId":536,"journal":{"name":"Electronic Materials Letters","volume":"21 5","pages":"667 - 678"},"PeriodicalIF":2.6,"publicationDate":"2025-07-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144990582","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Enhanced Electromagnetic Shielding Via Sequential Exfoliation of NbSe2 Thin Film: Structural and Electrical Optimization 通过连续剥离NbSe2薄膜增强电磁屏蔽:结构和电学优化
IF 2.6 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2025-07-10 DOI: 10.1007/s13391-025-00585-5
Won-Jin Kim, Kun-Woo Nam, Sung-Hoon Park

This study investigates the impact of sequential exfoliation on the structural, electrical, and electromagnetic interference (EMI) shielding properties of NbSe2 thin films. Sequential exfoliation yields two distinct films: the 1st, derived from the initial exfoliation, and the 2nd, obtained from further exfoliation of the residual material. Comparative analysis reveals that the 2nd film significantly enhanced total shielding effectiveness in the 8.2–12.4 GHz range, primarily due to its superior absorption shielding effectiveness. This enhancement is attributed to forming a highly uniform, laminated two-dimensional structure, which optimizes electrical conductivity and promotes effective electromagnetic wave dissipation through the skin effect. In contrast, the 1st film contains structural defects and residual oxides, which disrupt conductive pathways and reduce overall shielding efficiency. The denser morphology of the 2nd film facilitates repeated internal reflections, leading to greater energy absorption, whereas the irregular structure of the 1st film limits absorption efficiency.

本研究探讨了顺序剥离对NbSe2薄膜结构、电和电磁干扰(EMI)屏蔽性能的影响。顺序剥落产生两种不同的薄膜:第一种是由最初的剥落产生的,第二种是由残留物质的进一步剥落产生的。对比分析表明,第二层膜在8.2-12.4 GHz范围内的总屏蔽效率显著提高,这主要是由于其优越的吸收屏蔽效率。这种增强是由于形成了高度均匀的层压二维结构,从而优化了导电性,并通过趋肤效应促进了有效的电磁波耗散。相比之下,第一层薄膜含有结构缺陷和残余氧化物,这些缺陷破坏了导电途径,降低了整体屏蔽效率。第二层膜的致密形态有利于重复的内部反射,从而导致更大的能量吸收,而第一层膜的不规则结构限制了吸收效率。
{"title":"Enhanced Electromagnetic Shielding Via Sequential Exfoliation of NbSe2 Thin Film: Structural and Electrical Optimization","authors":"Won-Jin Kim,&nbsp;Kun-Woo Nam,&nbsp;Sung-Hoon Park","doi":"10.1007/s13391-025-00585-5","DOIUrl":"10.1007/s13391-025-00585-5","url":null,"abstract":"<div><p>This study investigates the impact of sequential exfoliation on the structural, electrical, and electromagnetic interference (EMI) shielding properties of NbSe<sub>2</sub> thin films. Sequential exfoliation yields two distinct films: the 1st, derived from the initial exfoliation, and the 2nd, obtained from further exfoliation of the residual material. Comparative analysis reveals that the 2nd film significantly enhanced total shielding effectiveness in the 8.2–12.4 GHz range, primarily due to its superior absorption shielding effectiveness. This enhancement is attributed to forming a highly uniform, laminated two-dimensional structure, which optimizes electrical conductivity and promotes effective electromagnetic wave dissipation through the skin effect. In contrast, the 1st film contains structural defects and residual oxides, which disrupt conductive pathways and reduce overall shielding efficiency. The denser morphology of the 2nd film facilitates repeated internal reflections, leading to greater energy absorption, whereas the irregular structure of the 1st film limits absorption efficiency.</p></div>","PeriodicalId":536,"journal":{"name":"Electronic Materials Letters","volume":"21 5","pages":"707 - 714"},"PeriodicalIF":2.6,"publicationDate":"2025-07-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144990561","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
X-ray Irradiation Induced Near-Infrared Persistent Luminescence from Li2Ge7O15:Cr3+ x射线辐照诱导Li2Ge7O15:Cr3+近红外持续发光
IF 2.6 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2025-07-05 DOI: 10.1007/s13391-025-00583-7
Xiaobin Liao, Wenli Shi, Zewen Liu, Runyao Liu, Jiaxu Zhang, Xiaoyan Fu, Hongwu Zhang

This study demonstrates the X-ray-activated near-infrared persistent luminescence in Li2Ge7O15:Cr3+ phosphors by the high-temperature solid-phase method. The influence of Cr3+ doping concentration on the structure, morphology and luminescent characteristics of the synthesized material was systematically investigated through X-ray diffraction (XRD), scanning electron microscopy (SEM), fluorescence spectroscopy, and persistent luminescence spectral analysis. The XRD result showed that the synthesized samples were pure. Under X-ray irradiation, the sample Li2Ge7O15:Cr3+ exhibited near-infrared persistent luminescence and photo stimulated luminescence. The photoluminescence and afterglow emission peaks were located at 699.8 nm, which was due to the 2E→4A2 of Cr3+. The optimal Cr3+ doping concentration was determined to be 0.05 %, at which the material demonstrated remarkable persistent luminescence performance. Notably, even if exposed to X-ray irradiation only for 5 s, the sample maintained exceptional near-infrared persistent emission characteristics lasting over 30 minutes. Furthermore, the material exhibited exceptional photostimulated luminescence (PSL) characteristics, with its near-infrared afterglow intensity being remarkably amplified under 980 nm laser irradiation. Thermoluminescence (TL) spectral analysis revealed the existence of multiple discrete trap energy levels within the host matrix, whose activation behavior was dependent on the excitation source. Under X-ray irradiation, the sample generated an additional effective trap level, which was more conducive to storing excitation energy. These results suggested that Li2Ge7O15:Cr3+ was a potential X-ray-induced near-infrared persistent luminescent material.

Graphical Abstract

本文采用高温固相法研究了Li2Ge7O15:Cr3+荧光粉的x射线激活近红外持续发光。通过x射线衍射(XRD)、扫描电镜(SEM)、荧光光谱和持续发光光谱分析,系统研究了Cr3+掺杂浓度对合成材料结构、形貌和发光特性的影响。XRD结果表明,合成的样品纯度较高。在x射线照射下,样品Li2Ge7O15:Cr3+表现出近红外持续发光和光激发发光。光致发光和余辉发射峰位于699.8 nm处,这是由于Cr3+的2E→4A2作用。Cr3+的最佳掺杂浓度为0.05%,在此浓度下材料具有良好的持续发光性能。值得注意的是,即使暴露在x射线照射下仅5秒,样品也能保持异常的近红外持续发射特性,持续时间超过30分钟。此外,在980 nm激光照射下,材料的近红外余辉强度显著增强,表现出优异的光激发发光(PSL)特性。热释光(TL)光谱分析表明,在基体中存在多个离散阱能级,其激活行为依赖于激发源。在x射线照射下,样品产生额外的有效阱能级,更有利于激发能的储存。这些结果表明,Li2Ge7O15:Cr3+是一种潜在的x射线诱导近红外持久发光材料。图形抽象
{"title":"X-ray Irradiation Induced Near-Infrared Persistent Luminescence from Li2Ge7O15:Cr3+","authors":"Xiaobin Liao,&nbsp;Wenli Shi,&nbsp;Zewen Liu,&nbsp;Runyao Liu,&nbsp;Jiaxu Zhang,&nbsp;Xiaoyan Fu,&nbsp;Hongwu Zhang","doi":"10.1007/s13391-025-00583-7","DOIUrl":"10.1007/s13391-025-00583-7","url":null,"abstract":"<div><p>This study demonstrates the X-ray-activated near-infrared persistent luminescence in Li<sub>2</sub>Ge<sub>7</sub>O<sub>15</sub>:Cr<sup>3+</sup> phosphors by the high-temperature solid-phase method. The influence of Cr<sup>3+</sup> doping concentration on the structure, morphology and luminescent characteristics of the synthesized material was systematically investigated through X-ray diffraction (XRD), scanning electron microscopy (SEM), fluorescence spectroscopy, and persistent luminescence spectral analysis. The XRD result showed that the synthesized samples were pure. Under X-ray irradiation, the sample Li<sub>2</sub>Ge<sub>7</sub>O<sub>15</sub>:Cr<sup>3+</sup> exhibited near-infrared persistent luminescence and photo stimulated luminescence. The photoluminescence and afterglow emission peaks were located at 699.8 nm, which was due to the <sup>2</sup>E→<sup>4</sup>A<sub>2</sub> of Cr<sup>3+</sup>. The optimal Cr<sup>3+</sup> doping concentration was determined to be 0.05 %, at which the material demonstrated remarkable persistent luminescence performance. Notably, even if exposed to X-ray irradiation only for 5 s, the sample maintained exceptional near-infrared persistent emission characteristics lasting over 30 minutes. Furthermore, the material exhibited exceptional photostimulated luminescence (PSL) characteristics, with its near-infrared afterglow intensity being remarkably amplified under 980 nm laser irradiation. Thermoluminescence (TL) spectral analysis revealed the existence of multiple discrete trap energy levels within the host matrix, whose activation behavior was dependent on the excitation source. Under X-ray irradiation, the sample generated an additional effective trap level, which was more conducive to storing excitation energy. These results suggested that Li<sub>2</sub>Ge<sub>7</sub>O<sub>15</sub>:Cr<sup>3+</sup> was a potential X-ray-induced near-infrared persistent luminescent material.</p><h3>Graphical Abstract</h3><div><figure><div><div><picture><source><img></source></picture></div></div></figure></div></div>","PeriodicalId":536,"journal":{"name":"Electronic Materials Letters","volume":"21 5","pages":"688 - 696"},"PeriodicalIF":2.6,"publicationDate":"2025-07-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144990559","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Improvement in Memory Operation of 2T0C DRAM Cells via Double-Layered InGaZnO Active Channel and Geometry Modulation 通过双层InGaZnO有源通道和几何调制改善2T0C DRAM单元的存储操作
IF 2.6 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2025-06-26 DOI: 10.1007/s13391-025-00582-8
Sang Han Ko, Sung-Min Yoon

To enhance the memory characteristics of the 2-transistor 0-capacitor (2T0C) DRAM cell, the double-layer (DL) InGaZnO channel was strategically introduced and the active geometry was optimally modulated. The DL channel, fabricated by modulating the oxygen partial pressure during RF sputtering, forms a heterojunction interface that introduces an additional conduction path, thereby significantly enhancing the device performance of the transistor. In memory operations, 2T0C DRAM cell employing the DL configuration exhibited more than twice the write speed, reaching a storage node voltage (VSN) of 0.8 V within 4 µs, compared to 10 µs for single-layer (SL) counterpart under identical charging conditions. Additionally, the optimal determination of the active geometry in transistors has been demonstrated to enhance charge storage efficiency and minimize VSN degradation. As a consequence of the enhanced positive-bias temperature stress stability, the DL device exhibited a data retention time of 44.3 s at 80 °C, which is approximately four times longer than that of the SL counterpart (11.5 s) with identical geometry. These findings confirm that the combined implementation of a DL IGZO channel and optimized device geometry provides an effective strategy for enhancing both the performance and reliability of 2T0C DRAM cell architectures.

Graphic Abstract

为了提高2晶体管0电容(2T0C) DRAM单元的存储特性,策略性地引入了双层InGaZnO通道,并对有源几何结构进行了优化调制。通过调制RF溅射过程中的氧分压制备的DL通道形成了一个异质结接口,引入了额外的传导路径,从而显著提高了晶体管的器件性能。在存储器操作中,采用DL配置的2T0C DRAM电池表现出两倍以上的写入速度,在4µs内达到0.8 V的存储节点电压(VSN),而在相同的充电条件下,单层(SL)电池需要10µs。此外,晶体管中有源几何结构的最佳确定已被证明可以提高电荷存储效率并最小化VSN退化。由于增强了正偏置温度应力稳定性,DL器件在80℃下的数据保留时间为44.3 s,大约是具有相同几何形状的SL对应器件(11.5 s)的四倍。这些发现证实了DL IGZO通道和优化器件几何结构的组合实现为提高2T0C DRAM单元架构的性能和可靠性提供了一种有效的策略。图形抽象
{"title":"Improvement in Memory Operation of 2T0C DRAM Cells via Double-Layered InGaZnO Active Channel and Geometry Modulation","authors":"Sang Han Ko,&nbsp;Sung-Min Yoon","doi":"10.1007/s13391-025-00582-8","DOIUrl":"10.1007/s13391-025-00582-8","url":null,"abstract":"<div><p>To enhance the memory characteristics of the 2-transistor 0-capacitor (2T0C) DRAM cell, the double-layer (DL) InGaZnO channel was strategically introduced and the active geometry was optimally modulated. The DL channel, fabricated by modulating the oxygen partial pressure during RF sputtering, forms a heterojunction interface that introduces an additional conduction path, thereby significantly enhancing the device performance of the transistor. In memory operations, 2T0C DRAM cell employing the DL configuration exhibited more than twice the write speed, reaching a storage node voltage (V<sub>SN</sub>) of 0.8 V within 4 µs, compared to 10 µs for single-layer (SL) counterpart under identical charging conditions. Additionally, the optimal determination of the active geometry in transistors has been demonstrated to enhance charge storage efficiency and minimize V<sub>SN</sub> degradation. As a consequence of the enhanced positive-bias temperature stress stability, the DL device exhibited a data retention time of 44.3 s at 80 °C, which is approximately four times longer than that of the SL counterpart (11.5 s) with identical geometry. These findings confirm that the combined implementation of a DL IGZO channel and optimized device geometry provides an effective strategy for enhancing both the performance and reliability of 2T0C DRAM cell architectures.</p><h3>Graphic Abstract</h3>\u0000<div><figure><div><div><picture><source><img></source></picture></div></div></figure></div></div>","PeriodicalId":536,"journal":{"name":"Electronic Materials Letters","volume":"21 5","pages":"679 - 687"},"PeriodicalIF":2.6,"publicationDate":"2025-06-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144990586","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Recent Progress in Resistive Switching Memory Devices Covering Metal Oxides, Polymers, Bioinspired Materials, and Halide Perovskites 包括金属氧化物、聚合物、生物激发材料和卤化物钙钛矿在内的阻性开关存储器件的最新进展
IF 2.6 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2025-06-12 DOI: 10.1007/s13391-025-00579-3
Hyojung Kim

Recent developments in emerging memory technologies have increasingly highlighted resistive switching (RS) devices, which offer nonvolatile performance, the potential for random data access, simple fabrication, and a streamlined structural design. Owing to these advantages, researchers are now investigating a variety of materials to realize effective RS properties. This review comprehensively examines the latest progress in RS memory devices, focusing on metal oxides, polymers, bioinspired compounds, and halide perovskites, and elucidating their distinct attributes. By integrating key studies, the discussion links the specialized characteristics of these materials to their applicability in memory devices and evaluates innovative approaches and ultimately underscoring the substantial promise of these emerging technologies. Interdisciplinary research efforts and recent investigations further affirm the remarkable transformative potential of RS devices in next-generation electronics.

Graphical Abstract

新兴存储技术的最新发展日益突出了电阻开关(RS)器件,它提供非易失性性能、随机数据访问的潜力、简单的制造和流线型的结构设计。由于这些优点,研究人员现在正在研究各种材料来实现有效的RS性能。本文综述了RS存储器件的最新进展,重点介绍了金属氧化物、聚合物、生物激发化合物和卤化物钙钛矿,并阐明了它们的独特属性。通过整合关键研究,讨论将这些材料的专业特性与它们在存储设备中的适用性联系起来,并评估创新方法,最终强调这些新兴技术的实质性前景。跨学科的研究努力和最近的调查进一步证实了RS设备在下一代电子产品中的显着变革潜力。图形抽象
{"title":"Recent Progress in Resistive Switching Memory Devices Covering Metal Oxides, Polymers, Bioinspired Materials, and Halide Perovskites","authors":"Hyojung Kim","doi":"10.1007/s13391-025-00579-3","DOIUrl":"10.1007/s13391-025-00579-3","url":null,"abstract":"<div><p>Recent developments in emerging memory technologies have increasingly highlighted resistive switching (RS) devices, which offer nonvolatile performance, the potential for random data access, simple fabrication, and a streamlined structural design. Owing to these advantages, researchers are now investigating a variety of materials to realize effective RS properties. This review comprehensively examines the latest progress in RS memory devices, focusing on metal oxides, polymers, bioinspired compounds, and halide perovskites, and elucidating their distinct attributes. By integrating key studies, the discussion links the specialized characteristics of these materials to their applicability in memory devices and evaluates innovative approaches and ultimately underscoring the substantial promise of these emerging technologies. Interdisciplinary research efforts and recent investigations further affirm the remarkable transformative potential of RS devices in next-generation electronics.</p><h3>Graphical Abstract</h3><div><figure><div><div><picture><source><img></source></picture></div></div></figure></div></div>","PeriodicalId":536,"journal":{"name":"Electronic Materials Letters","volume":"21 4","pages":"487 - 503"},"PeriodicalIF":2.6,"publicationDate":"2025-06-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145143173","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Electrostatic Self-Assembly of Upconversion-Functionalized Z-Scheme Heterojunction Photocatalyst and its Environmental Applications 上转换功能化z型异质结光催化剂的静电自组装及其环境应用
IF 2.6 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2025-05-30 DOI: 10.1007/s13391-025-00580-w
Xinyuan Chen, Weiyang Chen, Jingjing Xu, Mindong Chen

The N-deficient g-C3N4/Bi3TaO7 composite photocatalyst with upconversion capability was synthesized via electrostatic self-assembly. Under visible light, it achieved 80.7% LVFX degradation efficiency, maintaining 65% performance under long-wavelength illumination. PL characterization demonstrated strong upconversion property, with the sample emitting blue light at 470 nm under 800 nm near-infrared excitation. Electrochemical analysis revealed the material’s band structure and confirmed the formation of a Z-scheme heterojunction. Based on these findings, we propose a degradation mechanism: Nitrogen defect levels act as intermediate states for electron transitions, enabling electrons to reach higher energy levels. This process generates high-energy photons that subsequently activate BTO for photocatalytic reactions.

Graphical Abstract

采用静电自组装的方法合成了具有上转化能力的缺氮g-C3N4/Bi3TaO7复合光催化剂。在可见光下,LVFX降解效率达到80.7%,在长波照明下保持65%的性能。PL表征显示出很强的上转换特性,样品在800 nm近红外激发下发出470 nm的蓝光。电化学分析揭示了材料的能带结构,并证实了z型异质结的形成。基于这些发现,我们提出了一种降解机制:氮缺陷水平作为电子跃迁的中间态,使电子达到更高的能级。这个过程产生高能光子,随后激活BTO进行光催化反应。图形抽象
{"title":"Electrostatic Self-Assembly of Upconversion-Functionalized Z-Scheme Heterojunction Photocatalyst and its Environmental Applications","authors":"Xinyuan Chen,&nbsp;Weiyang Chen,&nbsp;Jingjing Xu,&nbsp;Mindong Chen","doi":"10.1007/s13391-025-00580-w","DOIUrl":"10.1007/s13391-025-00580-w","url":null,"abstract":"<div><p>The N-deficient g-C<sub>3</sub>N<sub>4</sub>/Bi<sub>3</sub>TaO<sub>7</sub> composite photocatalyst with upconversion capability was synthesized via electrostatic self-assembly. Under visible light, it achieved 80.7% LVFX degradation efficiency, maintaining 65% performance under long-wavelength illumination. PL characterization demonstrated strong upconversion property, with the sample emitting blue light at 470 nm under 800 nm near-infrared excitation. Electrochemical analysis revealed the material’s band structure and confirmed the formation of a Z-scheme heterojunction. Based on these findings, we propose a degradation mechanism: Nitrogen defect levels act as intermediate states for electron transitions, enabling electrons to reach higher energy levels. This process generates high-energy photons that subsequently activate BTO for photocatalytic reactions.</p><h3>Graphical Abstract</h3><div><figure><div><div><picture><source><img></source></picture></div></div></figure></div></div>","PeriodicalId":536,"journal":{"name":"Electronic Materials Letters","volume":"21 4","pages":"613 - 625"},"PeriodicalIF":2.6,"publicationDate":"2025-05-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145170946","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Effects of Rotating Speed of Rotating Cylinder Electrode and Bath Composition on Fe–Ni Alloy Electroplating 旋转圆柱电极转速及镀液成分对Fe-Ni合金电镀的影响
IF 2.6 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2025-05-23 DOI: 10.1007/s13391-025-00571-x
Na-Young Kang, Jae-Ho Lee

Fe–Ni alloy was electroplated on Ti rotating cylinder electrode(RCE) at various conditions, varying rotating speed and bath conditions. The inhibition of Ni reduction increased with rotating speed of the electrode, leading to higher Fe content of deposits. The composition change with rotating speed was more apparent for RCE than stationary planar electrode, however, the trend of compositional change in the thickness direction appeared the same regardless of cathode type. Hydrogen evolution was also promoted with rise of rotating speed, causing more brittle deposits and decrease in current efficiency. To obtain complete Fe–Ni invar film (36–40 wt% Ni) without damage, not only the rotating speed but also the bath composition controlled. The Fe content of deposits increased with concentration of Fe2+ in the bath, and the composition of films were within target range except the Fe-richer back side than front side.

Graphical Abstract

在不同转速和不同镀液条件下,在Ti旋转圆柱形电极(RCE)上电镀Fe-Ni合金。随着电极转速的增加,对Ni还原的抑制作用增强,导致镀层铁含量增加。相对于固定平面电极,RCE的成分随转速的变化更为明显,但无论阴极类型如何,其在厚度方向上的变化趋势都是一致的。转速的增加促进了析氢,导致脆性沉积增多,电流效率降低。为了获得完整的Fe-Ni invar薄膜(36-40 wt% Ni)而不损坏,不仅要控制转速,而且要控制镀液成分。随着镀液中Fe2+浓度的增加,镀层的铁含量逐渐增加,膜的组成除背面比正面富铁外均在目标范围内。图形抽象
{"title":"Effects of Rotating Speed of Rotating Cylinder Electrode and Bath Composition on Fe–Ni Alloy Electroplating","authors":"Na-Young Kang,&nbsp;Jae-Ho Lee","doi":"10.1007/s13391-025-00571-x","DOIUrl":"10.1007/s13391-025-00571-x","url":null,"abstract":"<div><p>Fe–Ni alloy was electroplated on Ti rotating cylinder electrode(RCE) at various conditions, varying rotating speed and bath conditions. The inhibition of Ni reduction increased with rotating speed of the electrode, leading to higher Fe content of deposits. The composition change with rotating speed was more apparent for RCE than stationary planar electrode, however, the trend of compositional change in the thickness direction appeared the same regardless of cathode type. Hydrogen evolution was also promoted with rise of rotating speed, causing more brittle deposits and decrease in current efficiency. To obtain complete Fe–Ni invar film (36–40 wt% Ni) without damage, not only the rotating speed but also the bath composition controlled. The Fe content of deposits increased with concentration of Fe<sup>2+</sup> in the bath, and the composition of films were within target range except the Fe-richer back side than front side.</p><h3>Graphical Abstract</h3>\u0000<div><figure><div><div><picture><source><img></source></picture></div></div></figure></div></div>","PeriodicalId":536,"journal":{"name":"Electronic Materials Letters","volume":"21 4","pages":"513 - 519"},"PeriodicalIF":2.6,"publicationDate":"2025-05-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145144722","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Synergistic Enhancement of White Luminescence in WLEDs via g-C3N4-Integrated Ln-MOF Composites with Suppressed Antenna Effect 抑制天线效应的g- c3n4集成Ln-MOF复合材料协同增强wled白光
IF 2.6 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2025-05-21 DOI: 10.1007/s13391-025-00578-4
Jinhu Guo, Qianwei Wang, Qi Wu, Xinyu Yang, Mengxuan Fang, Yang Li, Li Zhang, Longcheng Wang

This study proposes a novel strategy to enhance the performance of white light-emitting diodes (WLEDs) by integrating graphitic carbon nitride (g-C3N4) as an independent blue emitter into Tb3+/Eu3+-doped lanthanide metal–organic frameworks (Ln-MOFs). Traditional Ln-MOF-based WLEDs suffer from low luminous efficiency due to the Antenna Effect, which compromises energy transfer between ligands and lanthanide ions. By incorporating g-C3N4 with high-concentration Tb3+/Eu3+-doped Ln-MOFs, the optimized composite material, g-C3N4@Tb0.95Eu0.05-MOF, demonstrated remarkable improvements in photoluminescence properties. Compared to conventional Gd0.978Tb0.02Eu0.002-MOF, the composite achieved a luminous flux of 1.24 lm, luminous efficacy of 1.66 lm/W, and color rendering index (CRI) of 91.6, representing 10.34-fold, 9.23-fold, and 9.0 enhancements, respectively. Mechanistic studies revealed no energy transfer between g-C3N4 and Ln3+ ions, enabling stable blue emission from g-C3N4 while high-concentration Tb3+ and Eu3+ ions enhanced green and red emissions. This work provides a promising approach for designing high-performance WLEDs.

Graphic Abstract

本研究提出了一种新的策略,通过将石墨氮化碳(g-C3N4)作为独立的蓝色发射器集成到Tb3+/Eu3+掺杂的镧系金属有机框架(mn - mofs)中来提高白光发光二极管(wled)的性能。传统的基于mn - mof的wled由于天线效应而导致发光效率低,这影响了配体和镧系离子之间的能量传递。通过将g-C3N4与高浓度Tb3+/Eu3+掺杂的Ln-MOFs相结合,优化后的复合材料g-C3N4@Tb0.95Eu0.05-MOF的光致发光性能得到了显著改善。与传统的Gd0.978Tb0.02Eu0.002-MOF相比,该复合材料的光通量为1.24 lm,光效为1.66 lm/W,显色指数(CRI)为91.6,分别提高了10.34倍、9.23倍和9.0倍。机理研究表明,g-C3N4和Ln3+离子之间没有能量转移,使g-C3N4的蓝色辐射稳定,而高浓度的Tb3+和Eu3+离子增强了绿色和红色辐射。这项工作为设计高性能wled提供了一种很有前途的方法。图形抽象
{"title":"Synergistic Enhancement of White Luminescence in WLEDs via g-C3N4-Integrated Ln-MOF Composites with Suppressed Antenna Effect","authors":"Jinhu Guo,&nbsp;Qianwei Wang,&nbsp;Qi Wu,&nbsp;Xinyu Yang,&nbsp;Mengxuan Fang,&nbsp;Yang Li,&nbsp;Li Zhang,&nbsp;Longcheng Wang","doi":"10.1007/s13391-025-00578-4","DOIUrl":"10.1007/s13391-025-00578-4","url":null,"abstract":"<div><p>This study proposes a novel strategy to enhance the performance of white light-emitting diodes (WLEDs) by integrating graphitic carbon nitride (g-C<sub>3</sub>N<sub>4</sub>) as an independent blue emitter into Tb<sup>3+</sup>/Eu<sup>3+</sup>-doped lanthanide metal–organic frameworks (Ln-MOFs). Traditional Ln-MOF-based WLEDs suffer from low luminous efficiency due to the Antenna Effect, which compromises energy transfer between ligands and lanthanide ions. By incorporating g-C<sub>3</sub>N<sub>4</sub> with high-concentration Tb<sup>3+</sup>/Eu<sup>3+</sup>-doped Ln-MOFs, the optimized composite material, g-C<sub>3</sub>N<sub>4</sub>@Tb<sub>0.95</sub>Eu<sub>0.05</sub>-MOF, demonstrated remarkable improvements in photoluminescence properties. Compared to conventional Gd<sub>0.978</sub>Tb<sub>0.02</sub>Eu<sub>0.002</sub>-MOF, the composite achieved a luminous flux of 1.24 lm, luminous efficacy of 1.66 lm/W, and color rendering index (CRI) of 91.6, representing 10.34-fold, 9.23-fold, and 9.0 enhancements, respectively. Mechanistic studies revealed no energy transfer between g-C<sub>3</sub>N<sub>4</sub> and Ln<sup>3+</sup> ions, enabling stable blue emission from g-C<sub>3</sub>N<sub>4</sub> while high-concentration Tb<sup>3+</sup> and Eu<sup>3+</sup> ions enhanced green and red emissions. This work provides a promising approach for designing high-performance WLEDs.</p><h3>Graphic Abstract</h3>\u0000<div><figure><div><div><picture><source><img></source></picture></div></div></figure></div></div>","PeriodicalId":536,"journal":{"name":"Electronic Materials Letters","volume":"21 4","pages":"599 - 612"},"PeriodicalIF":2.6,"publicationDate":"2025-05-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145168006","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Purification of Alq3 Using Ionic Liquids: Effects on Purity and Mobility for Improved OLED Performance 离子液体纯化Alq3:纯度和迁移率对OLED性能的影响
IF 2.6 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2025-05-20 DOI: 10.1007/s13391-025-00577-5
Dong-Su Kim, Tae Won Ha, In Jae Park, Dae Yun Lim, Young Baek Kim, Jin Hyeok Kim, Dong Chan Shin, Chil-Hyoung Lee

Alq3 exists in five crystalline phases, with the δ-phase offering excellent charge transport characteristics owing to its minimal π-orbital overlap and short intermolecular binding distance. Previously, the purification of Alq3 to obtain this specific phase was achieved using ionic liquids instead of sublimation methods. By controlling concentration and temperature, high-purity δ-phase Alq3 could be obtained. In this study, the effectiveness of purifying Alq3 using ionic liquids was examined not through high-performance liquid chromatography measurements but by fabricating and characterizing organic light-emitting devices (OLEDs) to assess improvements in purity and mobility. I–V–L measurements of the fabricated devices revealed a decrease in threshold voltage, an increase in maximum luminance, and a reduction in sub-threshold swing after purification. The I–V characteristics confirmed the effectiveness of ionic-liquid-based purification in enhancing material purity. Lastly, electron-only devices were fabricated, and charge mobility was calculated using the Mott–Gurney equation. The simulation and experimental results were compared to clarify the influence of δ-phase Alq3 purified with ionic liquids on OLED performance.

Graphical Abstract

Alq3存在于5个晶相中,δ相中π轨道重叠最小,分子间结合距离短,具有良好的电荷输运特性。以前,Alq3的纯化是使用离子液体而不是升华方法来获得这种特定相的。通过控制浓度和温度,可以得到高纯度的δ相Alq3。在这项研究中,使用离子液体净化Alq3的有效性不是通过高效液相色谱测量,而是通过制造和表征有机发光器件(oled)来评估纯度和迁移率的提高。制备器件的I-V-L测量表明,净化后的阈值电压降低,最大亮度增加,亚阈值摆动减少。I-V特性证实了离子液体基净化在提高材料纯度方面的有效性。最后,制备了纯电子器件,并利用Mott-Gurney方程计算了电荷迁移率。将模拟结果与实验结果进行比较,阐明离子液体纯化δ相Alq3对OLED性能的影响。图形抽象
{"title":"Purification of Alq3 Using Ionic Liquids: Effects on Purity and Mobility for Improved OLED Performance","authors":"Dong-Su Kim,&nbsp;Tae Won Ha,&nbsp;In Jae Park,&nbsp;Dae Yun Lim,&nbsp;Young Baek Kim,&nbsp;Jin Hyeok Kim,&nbsp;Dong Chan Shin,&nbsp;Chil-Hyoung Lee","doi":"10.1007/s13391-025-00577-5","DOIUrl":"10.1007/s13391-025-00577-5","url":null,"abstract":"<div><p>Alq<sub>3</sub> exists in five crystalline phases, with the δ-phase offering excellent charge transport characteristics owing to its minimal π-orbital overlap and short intermolecular binding distance. Previously, the purification of Alq<sub>3</sub> to obtain this specific phase was achieved using ionic liquids instead of sublimation methods. By controlling concentration and temperature, high-purity δ-phase Alq<sub>3</sub> could be obtained. In this study, the effectiveness of purifying Alq<sub>3</sub> using ionic liquids was examined not through high-performance liquid chromatography measurements but by fabricating and characterizing organic light-emitting devices (OLEDs) to assess improvements in purity and mobility. I–V–L measurements of the fabricated devices revealed a decrease in threshold voltage, an increase in maximum luminance, and a reduction in sub-threshold swing after purification. The I–V characteristics confirmed the effectiveness of ionic-liquid-based purification in enhancing material purity. Lastly, electron-only devices were fabricated, and charge mobility was calculated using the Mott–Gurney equation. The simulation and experimental results were compared to clarify the influence of δ-phase Alq<sub>3</sub> purified with ionic liquids on OLED performance.</p><h3>Graphical Abstract</h3><div><figure><div><div><picture><source><img></source></picture></div></div></figure></div></div>","PeriodicalId":536,"journal":{"name":"Electronic Materials Letters","volume":"21 4","pages":"568 - 578"},"PeriodicalIF":2.6,"publicationDate":"2025-05-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145166835","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Effects of Work Function and Thermal Stability of Top Electrode Materials on Electrical Properties of ZrO2-Based DRAM Capacitors 顶电极材料的功函数和热稳定性对zro2基DRAM电容器电性能的影响
IF 2.6 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2025-05-08 DOI: 10.1007/s13391-025-00573-9
Hyeongjun Kim, Kyungmin Choi, Hojin Lee, Woongkyu Lee

The effects of work function and thermal stability of top electrode (TE) materials on the electrical properties of TE/ZrO2/TiN capacitors for dynamic random-access memory applications were investigated. TEs of Au, Ag, and Al were deposited via thermal evaporation on the atomic-layer-deposited ZrO2 dielectric layer on a TiN bottom electrode. The high work function of 5.1 eV of Au induced a very stable insulating property, while Ag and Al showed relatively higher leakage current with equivalent dielectric layer fabrication process. To evaluate the interfacial properties between the electrode and dielectric as well as the thermal stability of the electrode, post-metallization annealing (PMA) was performed in an air ambient at 400 °C for 30 min. Ag+ ion was diffused into the ZrO2 layer and Al was oxidized to Al2O3 at the interface for Ag and Al TEs, respectively, and severe capacitance degradation occurred. However, Au TE exhibited superior interfacial properties after PMA owing to a curing effect that promoted reducing oxygen vacancies and imperfections near the TE interface, and improved both dielectric and insulating properties.

Graphical abstract

研究了顶电极(TE)材料的功函数和热稳定性对动态随机存取存储器用TE/ZrO2/TiN电容器电性能的影响。将Au、Ag和Al的te通过热蒸发沉积在TiN底电极上原子层沉积的ZrO2介电层上。Au的高功函数(5.1 eV)产生了非常稳定的绝缘性能,而Ag和Al在等效介质层制作工艺下表现出相对较高的泄漏电流。为了评估电极和电介质之间的界面性能以及电极的热稳定性,在400°C的空气环境中进行金属化后退火(PMA) 30分钟。Ag+离子扩散到ZrO2层,Al分别在Ag和Al TEs的界面处氧化为Al2O3,发生了严重的电容退化。然而,经过PMA处理的Au TE表现出优异的界面性能,因为固化效应促进了TE界面附近氧空位和缺陷的减少,并提高了介电和绝缘性能。图形抽象
{"title":"Effects of Work Function and Thermal Stability of Top Electrode Materials on Electrical Properties of ZrO2-Based DRAM Capacitors","authors":"Hyeongjun Kim,&nbsp;Kyungmin Choi,&nbsp;Hojin Lee,&nbsp;Woongkyu Lee","doi":"10.1007/s13391-025-00573-9","DOIUrl":"10.1007/s13391-025-00573-9","url":null,"abstract":"<div><p>The effects of work function and thermal stability of top electrode (TE) materials on the electrical properties of TE/ZrO<sub>2</sub>/TiN capacitors for dynamic random-access memory applications were investigated. TEs of Au, Ag, and Al were deposited via thermal evaporation on the atomic-layer-deposited ZrO<sub>2</sub> dielectric layer on a TiN bottom electrode. The high work function of 5.1 eV of Au induced a very stable insulating property, while Ag and Al showed relatively higher leakage current with equivalent dielectric layer fabrication process. To evaluate the interfacial properties between the electrode and dielectric as well as the thermal stability of the electrode, post-metallization annealing (PMA) was performed in an air ambient at 400 °C for 30 min. Ag<sup>+</sup> ion was diffused into the ZrO<sub>2</sub> layer and Al was oxidized to Al<sub>2</sub>O<sub>3</sub> at the interface for Ag and Al TEs, respectively, and severe capacitance degradation occurred. However, Au TE exhibited superior interfacial properties after PMA owing to a curing effect that promoted reducing oxygen vacancies and imperfections near the TE interface, and improved both dielectric and insulating properties.</p><h3>Graphical abstract</h3>\u0000<div><figure><div><div><picture><source><img></source></picture></div></div></figure></div></div>","PeriodicalId":536,"journal":{"name":"Electronic Materials Letters","volume":"21 4","pages":"559 - 567"},"PeriodicalIF":2.6,"publicationDate":"2025-05-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145163218","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
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Electronic Materials Letters
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