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Magnetic design of the K-4GSR combined-function booster dipole magnet K-4GSR多功能升压偶极磁体的磁性设计
IF 1 4区 物理与天体物理 Q3 PHYSICS, MULTIDISCIPLINARY Pub Date : 2026-04-17 DOI: 10.1007/s40042-026-01621-9
Inwoo Chun, Beom Jun Kim, Seo Hyeon Ahn, Garam Hahn, Young Gyu Jung, Dong Eon Kim

The K-4GSR project targets a 4.0 GeV 4th generation synchrotron radiation source with (sim )800 m circumference and 4 GeV beam energy. It features a 7 Multi-Bend Achromat (MBA) lattice structure with a beam emittance of less than 100 pm. It employs a 4 GeV full-energy injection using a booster installed in the same tunnel with the storage ring. The booster ramps the 200 MeV injection beam to 4 GeV beam energy for the storage ring injection and operates at 2 Hz. The booster consists of 60 combined-function dipoles, and 66 quadrupoles, with additional sextupoles and correctors. Combined-function dipoles are chosen as bending lattice elements to minimize the number of magnets and the total costs. In this study, the 2D pole face optimization, the 3D FEM analysis, and a detailed reference orbit, which is slightly different from a pure bending orbit are analyzed.

K-4GSR项目目标是4.0 GeV第四代同步辐射源,周长(sim ) 800 m,束流能量4 GeV。它具有7多弯消色差(MBA)晶格结构,光束发射率小于100 pm。它采用4 GeV全能量注入,使用与存储环安装在同一隧道中的助推器。助推器将200 MeV的注入光束提升到4 GeV的束流能量,用于存储环注入,工作频率为2hz。助推器由60个组合功能偶极、66个四极、额外的六极和校正器组成。选择组合函数偶极子作为弯曲点阵单元,以减少磁体数量和总成本。在本研究中,对二维极点面优化、三维有限元分析以及与纯弯曲轨道略有不同的详细参考轨道进行了分析。
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引用次数: 0
Three-dimensional position reconstruction of a cascade gamma ray-emitting source based on geometric back-projection through the angle of incidence 基于入射角几何背投影的级联伽马射线源三维位置重建
IF 1 4区 物理与天体物理 Q3 PHYSICS, MULTIDISCIPLINARY Pub Date : 2026-04-17 DOI: 10.1007/s40042-026-01645-1
Leonid L. Nkuba, Enock M. Mwita, Innocent J. Junior, Elisha E. Edmund, Innocent J. Lugendo

A novel technique has been developed to determine the three-dimensional position of a source emitting multiple cascade γ-rays with sub-millimeter accuracy using dual-layered GSO (Ce) scintillation detectors. This method reconstructs the source position by processing filtered energy and detector hit positions through a back-projection algorithm along the paths of incident γ-rays. The detector array and an 111In-ion point source at five locations within the central detection volume were simulated using the GATE Monte Carlo framework. For a source at the detector center (0, 0, 0), the reconstructed coordinates are − 0.001 mm, − 0.001 mm, and − 0.001 mm along X, Y, and Z. This indicates that the reconstructed source centroid was centrally located and well within the spatial resolution limits of the detector system. For other simulated source positions, the reconstructed coordinates matched approximately 99.8% of the actual simulated positions, although some positions varied between 70.9% and 125% of the true values. Except for source at the center, other source positions were reported with uncertainty ranging from 0.006 × 10–3 mm to ± 5.480 × 10–3 mm. While reconstruction at the transaxial and axial edges is less precise due to limited valid coincidence events, the results demonstrate the method’s robustness. The achieved reconstruction precision indicates potential applications in nuclear medicine, nuclear security, radioactive waste assay, and proton beam therapy.

本文提出了一种利用双层GSO (Ce)闪烁探测器以亚毫米精度确定多级γ射线发射源的三维位置的新技术。该方法通过沿入射γ射线路径的反投影算法,对滤波后的能量和探测器命中位置进行处理,重建源位置。利用GATE蒙特卡罗框架对探测器阵列和中心探测体内5个位置的111in离子点源进行了模拟。对于位于探测器中心(0,0,0)的源,沿X, Y和z的重建坐标分别为- 0.001 mm, - 0.001 mm和- 0.001 mm,这表明重建的源质心位于中心,并且在探测器系统的空间分辨率限制内。对于其他模拟震源位置,重建的坐标与实际模拟位置的匹配度约为99.8%,尽管有些位置的匹配度在70.9%到125%之间。除中心源外,其他源位置的不确定度范围为0.006 × 10-3 mm至±5.480 × 10-3 mm。虽然由于有效重合事件的限制,在轴向和轴向边缘的重建精度较低,但结果表明该方法具有鲁棒性。所获得的重建精度表明在核医学、核安全、放射性废物分析和质子束治疗方面有潜在的应用前景。
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引用次数: 0
Defect evolution comparison between He+ and He2+ ions irradiation on graphene He+和He2+离子辐照石墨烯缺陷演化比较
IF 1 4区 物理与天体物理 Q3 PHYSICS, MULTIDISCIPLINARY Pub Date : 2026-04-15 DOI: 10.1007/s40042-026-01635-3
Junhyeok Seo, Sunmog Yeo, Young Jun Yoon, Kibeom Kim

This study investigates the role of the projectile's charge state in the defect engineering of graphene using ion beams. A comparison was made between defects induced by He+ and He2+ ions at an identical kinetic energy of 120 keV. Raman spectroscopy analysis showed that He2+ ions generated a higher defect density, ranging from 40 to 65%, compared to He⁺ ions. To investigate how this defect difference impacts device performance, we fabricated and tested chemiresistive gas sensors, where devices irradiated with He2+ showed improved sensitivity to hydrogen. The observation of higher defect generation for He2+ can be explained by the absence of electron screening, which is present for the He⁺ ion. This condition could increase the Coulomb interaction with target carbon nuclei, consistent with a larger Rutherford scattering cross-section. The results indicate that, even within the same ion species, the ion charge state can serve as an additional parameter for modifying the properties of graphene-based devices.

本研究探讨了弹丸的电荷状态在离子束石墨烯缺陷工程中的作用。比较了He+和He2+离子在相同动能120 keV下诱导的缺陷。拉曼光谱分析表明,与He⁺相比,He2+离子产生的缺陷密度更高,在40%到65%之间。为了研究这种缺陷差异如何影响器件性能,我们制作并测试了化学电阻式气体传感器,其中He2+辐照的器件对氢的灵敏度有所提高。He2+的缺陷生成率较高,这可以用He +没有电子屏蔽来解释,He +也存在电子屏蔽。这种条件可以增加与目标碳核的库仑相互作用,与更大的卢瑟福散射截面相一致。结果表明,即使在相同的离子种类中,离子电荷状态也可以作为修饰石墨烯基器件性能的附加参数。
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引用次数: 0
Study of the influence of implant material on magnetocardiography measurements using SQUID sensors 植入材料对SQUID传感器心脏磁图测量影响的研究
IF 1 4区 物理与天体物理 Q3 PHYSICS, MULTIDISCIPLINARY Pub Date : 2026-04-13 DOI: 10.1007/s40042-026-01640-6
Ho Seong Lee, Jae Hyun Ahn, Yong Hwan Kim

A magnetocardiography (MCG) system is a medical device that diagnoses cardiac disease by measuring magnetic fields generated from electric currents flowing through the myocardium. However, the accuracy of measurement data can be degraded if strong magnetic materials are present or magnetic field changes occur near the MCG system. With the widespread use of implants, the number of patients with metallic implants is increasing, but there is a lack of in-depth research on the potential impact of implant materials on the results of the MCG examination. This study aims to analyze the effect of implant materials on MCG measurements and establish relevant criteria. In this study, a 96-channel MCG system employing Superconducting Quantum Interference Device (SQUID) sensors, specifically first-order gradiometers based on the Double Relaxation Oscillation SQUID method, and a magnetically shielded room were utilized. Titanium-6Aluminum-4Vanadium ELI was selected as the representative implant material sample. Experiments were conducted under extreme conditions, where a sample significantly larger than an actual implant was placed as close as possible to the sensors. As a result, when the implant material was at the minimum distance to the sensor, the noise increase was approximately 0.7 fT/√Hz, which satisfies the sensitivity criteria for MCG. Furthermore, since these results were obtained under severely adverse conditions designed to maximize the noise impact, it is anticipated that the effect would be even more negligible in actual clinical settings. In conclusion, it was confirmed that common implant materials have little to no effect on MCG measurements.

心脏磁图(MCG)系统是一种通过测量流经心肌的电流产生的磁场来诊断心脏病的医疗设备。然而,如果存在强磁性材料或MCG系统附近发生磁场变化,则测量数据的准确性可能会降低。随着种植体的广泛使用,金属种植体患者数量不断增加,但种植体材料对MCG检查结果的潜在影响缺乏深入研究。本研究旨在分析种植体材料对MCG测量的影响,并建立相关标准。在本研究中,使用了一个96通道的MCG系统,该系统采用超导量子干涉器件(SQUID)传感器,特别是基于双弛豫振荡SQUID方法的一阶梯度仪,并使用了一个磁屏蔽室。选择钛-6铝-4钒ELI作为代表性种植材料样品。实验是在极端条件下进行的,在极端条件下,一个比实际植入物大得多的样本被放置在尽可能靠近传感器的地方。因此,当植入材料与传感器的距离最小时,噪声增加约为0.7 fT/√Hz,满足MCG的灵敏度标准。此外,由于这些结果是在旨在最大化噪声影响的严重不利条件下获得的,因此预计在实际临床环境中,这种影响甚至可以忽略不计。综上所述,普通种植体材料对MCG测量几乎没有影响。
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引用次数: 0
Influence of background pressure on beam extraction and focusing dynamics in a small PIG ion source 背景压力对小型PIG离子源中光束提取和聚焦动力学的影响
IF 1 4区 物理与天体物理 Q3 PHYSICS, MULTIDISCIPLINARY Pub Date : 2026-04-10 DOI: 10.1007/s40042-026-01636-2
Jiseong Nam, Kyoung-Jae Chung

Vacuum degradation in the beam device is a critical concern in high-precision ion beam processing, as it perturbs beam optics and reduces energy efficiency. While pressure effects in the transport region are mitigated by space charge compensation and charge exchanges, the dynamics in the extraction region of low-energy sources under elevated vacuum conditions remain insufficiently understood. In this paper, we experimentally investigate the influence of background pressure on beam focusing and extraction efficiency in a small penning ion gauge (PIG) ion source, where the extraction section constitutes a dominant part of the beamline. Our results reveal that, under elevated pressure conditions, the current impinging on the suppression electrode increases with higher suppression voltages—a trend contrary to the low-pressure conditions. We demonstrate that this current loss increment is attributed to the trapping of low-energy ions generated via charge exchange and momentum transfer, rather than to the conventional electrostatic over-focusing mechanism. These findings indicate that elevated background pressures primarily accelerate device degradation through collision-induced beam loss, necessitating rigorous vacuum management for stable operation.

光束器件中的真空退化是高精度离子束加工中的一个关键问题,因为它会干扰光束光学并降低能量效率。虽然输运区的压力效应可以通过空间电荷补偿和电荷交换来缓解,但在高真空条件下低能量源提取区的动力学仍然没有得到充分的了解。本文实验研究了背景压力对光束聚焦和提取效率的影响,其中提取部分构成了光束线的主要部分。我们的研究结果表明,在高压条件下,冲击在抑制电极上的电流随着抑制电压的升高而增加,这与低压条件相反。我们证明,这种电流损失增量归因于通过电荷交换和动量转移产生的低能离子的捕获,而不是传统的静电过度聚焦机制。这些发现表明,背景压力升高主要是通过碰撞引起的光束损耗加速器件退化,因此需要严格的真空管理来稳定运行。
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引用次数: 0
Plasma-free KOH-based surface activation for enhanced hybrid bonding strength 无等离子体koh表面活化增强杂化键合强度
IF 1 4区 物理与天体物理 Q3 PHYSICS, MULTIDISCIPLINARY Pub Date : 2026-04-10 DOI: 10.1007/s40042-026-01633-5
Youngjoon Cha, Gyeongyeol Lee, An Hoang-Thuy Nguyen, Rino Choi

This work demonstrates a plasma-free, short-time potassium hydroxide (KOH) wet pretreatment for a hybrid bonding process, targeting high SiO2–SiO2 bonding strength while suppressing Cu surface oxidation. KOH treatment at 50 °C for 15 s significantly improved SiO2 wettability, reducing the deionized water contact angle, and enabled a maximum shear strength of 29.6 MPa after 300 °C annealing. The oxide etching behavior was quantified using a TiO2 cap structure, confirming time-dependent selective SiO2 thinning in 5 M KOH at 50 °C. To evaluate the Cu surface stability, 400 nm Cu films were analyzed after exposure to citric acid and subsequent KOH treatment. While atomic force microscope (AFM) roughness showed no pronounced change, the mean conductive AFM current indicated progressively reduced conduction with longer KOH treatment. These results identify short-time KOH as a key process window that balances surface activation and Cu stability for plasma-free hybrid bonding.

这项工作展示了一种无等离子体、短时间氢氧化钾(KOH)湿法预处理混合键合工艺,旨在提高SiO2-SiO2键合强度,同时抑制Cu表面氧化。50℃KOH处理15 s显著提高了SiO2的润湿性,降低了去离子水接触角,300℃退火后最大抗剪强度达到29.6 MPa。使用TiO2帽结构对氧化物蚀刻行为进行了量化,证实了在50°C下5 M KOH条件下SiO2随时间的选择性减薄。为了评价Cu的表面稳定性,我们分析了柠檬酸和KOH处理后的400 nm Cu膜。虽然原子力显微镜(AFM)粗糙度没有明显变化,但平均导电AFM电流表明,随着KOH处理时间的延长,电导率逐渐降低。这些结果表明,短时间KOH是平衡无等离子体杂化键的表面活化和Cu稳定性的关键过程窗口。
{"title":"Plasma-free KOH-based surface activation for enhanced hybrid bonding strength","authors":"Youngjoon Cha,&nbsp;Gyeongyeol Lee,&nbsp;An Hoang-Thuy Nguyen,&nbsp;Rino Choi","doi":"10.1007/s40042-026-01633-5","DOIUrl":"10.1007/s40042-026-01633-5","url":null,"abstract":"<div><p>This work demonstrates a plasma-free, short-time potassium hydroxide (KOH) wet pretreatment for a hybrid bonding process, targeting high SiO<sub>2</sub>–SiO<sub>2</sub> bonding strength while suppressing Cu surface oxidation. KOH treatment at 50 °C for 15 s significantly improved SiO<sub>2</sub> wettability, reducing the deionized water contact angle, and enabled a maximum shear strength of 29.6 MPa after 300 °C annealing. The oxide etching behavior was quantified using a TiO<sub>2</sub> cap structure, confirming time-dependent selective SiO<sub>2</sub> thinning in 5 M KOH at 50 °C. To evaluate the Cu surface stability, 400 nm Cu films were analyzed after exposure to citric acid and subsequent KOH treatment. While atomic force microscope (AFM) roughness showed no pronounced change, the mean conductive AFM current indicated progressively reduced conduction with longer KOH treatment. These results identify short-time KOH as a key process window that balances surface activation and Cu stability for plasma-free hybrid bonding.</p></div>","PeriodicalId":677,"journal":{"name":"Journal of the Korean Physical Society","volume":"89 2","pages":"198 - 203"},"PeriodicalIF":1.0,"publicationDate":"2026-04-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"148366105","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Specific heat investigation of superconducting properties in 2H-NbSe2 single crystals 2H-NbSe2单晶超导性能的比热研究
IF 1 4区 物理与天体物理 Q3 PHYSICS, MULTIDISCIPLINARY Pub Date : 2026-04-10 DOI: 10.1007/s40042-026-01632-6
Joo Chan Kim, Yeong Uk Choi, Su Min Lee, Jong Yeon Kim, Jung Jin Park, Min Su Yeo, Jong Hun Kim, Jong Hoon Jung

We report on the crystal growth and superconducting properties of the transition-metal dichalcogenide 2H-NbSe2. Millimeter-scale 2H-NbSe2 single crystals with well-defined hexagonal platelets were grown by chemical vapor transport with iodine (I2) as the transport agent. Rietveld analysis of X-ray powder diffraction confirms the single-phase P63/mmc space group with a = b = 3.443 Å and c = 12.542 Å. Electrical transport and magnetic measurements confirm bulk superconductivity (Tc = 7.06 K), coexistence of charge density wave order (TCDW = 33 K), and nearly ideal diamagnetism (4πχ ~-0.98 at 2 K). Temperature-dependent specific heat shows a clear jump at Tc, which can be analyzed using a two-gap s + s-wave model with different weights. Approximately 97% of the total Sommerfeld coefficient is associated with the larger-gap ((Delta_{1} sim 1.68) meV), while the smaller-gap ((Delta_{2} sim 0.27) meV) accounts for the remaining 3%. This work provides useful quantitative information on multiband superconductivity in 2H-NbSe2 single crystals.

本文报道了过渡金属二硫化物2H-NbSe2的晶体生长和超导性能。以碘(I2)为运输剂,采用化学气相输运法制备了具有清晰六边形血小板的毫米级2H-NbSe2单晶。x射线粉末衍射Rietveld分析证实了单相P63/mmc空间群,a = b = 3.443 Å, c = 12.542 Å。电输运和磁测量证实了材料的体超导性(Tc = 7.06 K)、电荷密度波序共存(TCDW = 33 K)和接近理想的抗磁性(2 K时4πχ -0.98)。温度相关的比热在Tc处表现出明显的跳跃,可以使用不同权重的双间隙s + s波模型进行分析。大约97% of the total Sommerfeld coefficient is associated with the larger-gap ((Delta_{1} sim 1.68) meV), while the smaller-gap ((Delta_{2} sim 0.27) meV) accounts for the remaining 3%. This work provides useful quantitative information on multiband superconductivity in 2H-NbSe2 single crystals.
{"title":"Specific heat investigation of superconducting properties in 2H-NbSe2 single crystals","authors":"Joo Chan Kim,&nbsp;Yeong Uk Choi,&nbsp;Su Min Lee,&nbsp;Jong Yeon Kim,&nbsp;Jung Jin Park,&nbsp;Min Su Yeo,&nbsp;Jong Hun Kim,&nbsp;Jong Hoon Jung","doi":"10.1007/s40042-026-01632-6","DOIUrl":"10.1007/s40042-026-01632-6","url":null,"abstract":"<div><p>We report on the crystal growth and superconducting properties of the transition-metal dichalcogenide 2H-NbSe<sub>2</sub>. Millimeter-scale 2H-NbSe<sub>2</sub> single crystals with well-defined hexagonal platelets were grown by chemical vapor transport with iodine (I<sub>2</sub>) as the transport agent. Rietveld analysis of X-ray powder diffraction confirms the single-phase P6<sub>3</sub>/mmc space group with <i>a</i> = <i>b</i> = 3.443 Å and <i>c</i> = 12.542 Å. Electrical transport and magnetic measurements confirm bulk superconductivity (<i>T</i><sub>c</sub> = 7.06 K), coexistence of charge density wave order (<i>T</i><sub>CDW</sub> = 33 K), and nearly ideal diamagnetism (4<i>πχ</i> ~-0.98 at 2 K). Temperature-dependent specific heat shows a clear jump at <i>T</i><sub>c</sub>, which can be analyzed using a two-gap <i>s</i> + <i>s</i>-wave model with different weights. Approximately 97% of the total Sommerfeld coefficient is associated with the larger-gap (<span>(Delta_{1} sim 1.68)</span> meV), while the smaller-gap (<span>(Delta_{2} sim 0.27)</span> meV) accounts for the remaining 3%. This work provides useful quantitative information on multiband superconductivity in 2H-NbSe<sub>2</sub> single crystals.</p></div>","PeriodicalId":677,"journal":{"name":"Journal of the Korean Physical Society","volume":"89 2","pages":"174 - 181"},"PeriodicalIF":1.0,"publicationDate":"2026-04-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"148366077","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Low-temperature atomic layer deposition of oriented ZnO thin films on c-plane Al2O3: influence of precursor ratio and growth temperature c面Al2O3上取向ZnO薄膜的低温原子层沉积:前驱体比和生长温度的影响
IF 1 4区 物理与天体物理 Q3 PHYSICS, MULTIDISCIPLINARY Pub Date : 2026-04-06 DOI: 10.1007/s40042-026-01623-7
Minh-Anh Nguyen Tran, Viet Huong Nguyen, Hung-Anh Tran Vu, Nguyen Dinh Nam, Ngoc Thanh Duong, Anh Tuan Duong, Taegi Kim, Chanyong Hwang

In this work, ZnO thin films were deposited on c-plane Al2O3 substrates by atomic layer deposition (ALD) under various growth conditions. The Zn/O feeding time ratios were adjusted from 0.5 to 3.5 at growth temperatures between 120 °C and 300 °C. Films grown at a temperature (Tg) of 200 °C exhibited superior crystallinity and pronounced (200) orientation compared to those grown at lower temperatures, as increased thermal energy promoted more effective surface diffusion and improved atomic arrangement. Raman and photoluminescence analyses revealed well-defined phonon modes and enhanced near-band-edge ultraviolet emission for the film grown at 200 °C with a Zn/O feeding time ratio of 1.5:2, indicating a high degree of structural uniformity and efficient radiative recombination. These findings elucidate how growth temperature and precursor stoichiometry govern the structural and optical quality of ALD-grown ZnO thin films, underscoring the potential of low-temperature ALD for producing high-quality ZnO layers suitable for semiconductor and optoelectronic device applications.

在不同的生长条件下,采用原子层沉积(ALD)的方法在c面Al2O3衬底上沉积ZnO薄膜。在120 ~ 300℃的生长温度下,Zn/O的加料时间比从0.5调整到3.5。与在较低温度下生长的薄膜相比,在温度(Tg)为200°C时生长的薄膜具有更好的结晶度和明显的(200)取向,因为增加的热能促进了更有效的表面扩散和改善了原子排列。拉曼和光致发光分析表明,在200°C下生长,Zn/O进料时间比为1.5:2,声子模式清晰,近带边紫外发射增强,表明该薄膜具有高度的结构均匀性和高效的辐射复合。这些发现阐明了生长温度和前驱体化学计量学如何控制ALD生长ZnO薄膜的结构和光学质量,强调了低温ALD生产适合半导体和光电子器件应用的高质量ZnO层的潜力。
{"title":"Low-temperature atomic layer deposition of oriented ZnO thin films on c-plane Al2O3: influence of precursor ratio and growth temperature","authors":"Minh-Anh Nguyen Tran,&nbsp;Viet Huong Nguyen,&nbsp;Hung-Anh Tran Vu,&nbsp;Nguyen Dinh Nam,&nbsp;Ngoc Thanh Duong,&nbsp;Anh Tuan Duong,&nbsp;Taegi Kim,&nbsp;Chanyong Hwang","doi":"10.1007/s40042-026-01623-7","DOIUrl":"10.1007/s40042-026-01623-7","url":null,"abstract":"<div><p>In this work, ZnO thin films were deposited on c-plane Al<sub>2</sub>O<sub>3</sub> substrates by atomic layer deposition (ALD) under various growth conditions. The Zn/O feeding time ratios were adjusted from 0.5 to 3.5 at growth temperatures between 120 °C and 300 °C. Films grown at a temperature (T<sub>g</sub>) of 200 °C exhibited superior crystallinity and pronounced (200) orientation compared to those grown at lower temperatures, as increased thermal energy promoted more effective surface diffusion and improved atomic arrangement. Raman and photoluminescence analyses revealed well-defined phonon modes and enhanced near-band-edge ultraviolet emission for the film grown at 200 °C with a Zn/O feeding time ratio of 1.5:2, indicating a high degree of structural uniformity and efficient radiative recombination. These findings elucidate how growth temperature and precursor stoichiometry govern the structural and optical quality of ALD-grown ZnO thin films, underscoring the potential of low-temperature ALD for producing high-quality ZnO layers suitable for semiconductor and optoelectronic device applications.</p></div>","PeriodicalId":677,"journal":{"name":"Journal of the Korean Physical Society","volume":"89 2","pages":"148 - 156"},"PeriodicalIF":1.0,"publicationDate":"2026-04-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"148366103","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Impact of interface states and series resistance on the electrical and dielectric response of ECR-PECVD SiO₂/p-Si MOS structures 界面态和串联电阻对ECR-PECVD sio2 /p-Si MOS结构电响应和介电响应的影响
IF 1 4区 物理与天体物理 Q3 PHYSICS, MULTIDISCIPLINARY Pub Date : 2026-04-03 DOI: 10.1007/s40042-026-01638-0
Omar Rejeiba, Alejandro F. Braña de cal, Adel Matoussi

In this work, we examine the electrical and dielectric characteristics of the SiO₂ oxide layer that was produced using the ECR-PECVD method on a p-Si substrate. The frequency range of 100 Hz–1 MHz has been used to record capacitance–voltage (C-Vg) and conductance-voltage (G/ω-Vg) properties. The interface states (Nss) and series resistance (Rs) effects are associated with anomalous peaks in the C-Vg and G-Vg plots. It demonstrates how the capacitance at low frequencies is influenced by the interface state. Because the interface state capacitance decreases with increasing frequency, the effect of series resistance on capacitance becomes noticeable at higher frequencies. In addition, the frequency dependence of dielectric constants (ε’, ε”), dielectric loss tangent (tanδ), electric modulus (M', M''), and the electrical conductivity (σac) is also studied for the Al/SiO2/p-Si (MOS) structure. The double logarithmic σac-w curve shows linear behavior, with its slope around 0.66 to 0.26, and this value of Al/SiO2/p-Si (MOS) structure has a high AC conductivity.

在这项工作中,我们研究了使用ECR-PECVD方法在p-Si衬底上产生的sio2氧化层的电学和介电特性。100hz - 1mhz的频率范围被用来记录电容电压(C-Vg)和电导电压(G/ω-Vg)特性。界面态(Nss)和串联电阻(Rs)效应与C-Vg和G-Vg图中的异常峰有关。它演示了低频电容如何受到界面状态的影响。由于界面状态电容随频率的增加而减小,因此串联电阻对电容的影响在较高频率时变得明显。此外,还研究了Al/SiO2/p-Si (MOS)结构的介电常数(ε′,ε”)、介电损耗正切(tanδ)、电模量(M′,M”)和电导率(σac)与频率的关系。双对数σac-w曲线呈线性,斜率在0.66 ~ 0.26之间,表明Al/SiO2/p-Si (MOS)结构具有较高的交流电导率。
{"title":"Impact of interface states and series resistance on the electrical and dielectric response of ECR-PECVD SiO₂/p-Si MOS structures","authors":"Omar Rejeiba,&nbsp;Alejandro F. Braña de cal,&nbsp;Adel Matoussi","doi":"10.1007/s40042-026-01638-0","DOIUrl":"10.1007/s40042-026-01638-0","url":null,"abstract":"<div><p>In this work, we examine the electrical and dielectric characteristics of the SiO₂ oxide layer that was produced using the ECR-PECVD method on a p-Si substrate. The frequency range of 100 Hz–1 MHz has been used to record capacitance–voltage (C-Vg) and conductance-voltage (G/ω-Vg) properties. The interface states (N<sub>ss</sub>) and series resistance (R<sub>s</sub>) effects are associated with anomalous peaks in the C-Vg and G-Vg plots. It demonstrates how the capacitance at low frequencies is influenced by the interface state. Because the interface state capacitance decreases with increasing frequency, the effect of series resistance on capacitance becomes noticeable at higher frequencies. In addition, the frequency dependence of dielectric constants (ε’, ε”), dielectric loss tangent (tanδ), electric modulus (M', M''), and the electrical conductivity (σ<sub>ac</sub>) is also studied for the Al/SiO<sub>2</sub>/p-Si (MOS) structure. The double logarithmic σ<sub>ac</sub>-w curve shows linear behavior, with its slope around 0.66 to 0.26, and this value of Al/SiO<sub>2</sub>/p-Si (MOS) structure has a high AC conductivity.</p></div>","PeriodicalId":677,"journal":{"name":"Journal of the Korean Physical Society","volume":"89 1","pages":"110 - 119"},"PeriodicalIF":1.0,"publicationDate":"2026-04-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"148261687","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Carbon-related nanometer-scale defects on MoS2 revealed by scanning tunneling microscopy 扫描隧道显微镜下二硫化钼表面碳相关纳米缺陷的研究
IF 1 4区 物理与天体物理 Q3 PHYSICS, MULTIDISCIPLINARY Pub Date : 2026-04-03 DOI: 10.1007/s40042-026-01634-4
Seungmin Park, Jeongseok Woo, Sangsoo Lee, Geunseop Lee

We present a scanning tunneling microscopy (STM) study of nanometer-scale surface defects on the 2H-MoS2(0001) surface of a natural single-crystal mineral. Two dominant types of nanometer-scale defects, denoted as B and D, were ubiquitously observed on freshly exfoliated surfaces in both ultra-high vacuum and ambient environments as well as on intentionally carbon-deposited surfaces. All these observations exclude an extrinsic adsorption-related origin and instead suggest a carbon-related bulk source. The B defects exhibit a pronounced bias-dependent contrast reversal, appearing as bright protrusions at negative sample biases and as dark depressions at positive biases. In contrast, the D defects appear consistently as dark depressions over the entire bias range. The defect population increases gradually over time, supporting an intrinsic bulk reservoir of carbon species. In addition, reversible interconversion between the B and D defects is observed during STM scanning, suggesting that they originate from the same defect species occupying closely related adsorption configurations with similar energies. These results identify carbon impurities as the origin of the most prevalent nanometer-scale surface defects on MoS2 and establish a consistent framework for interpreting their STM contrast and evolution.

本文采用扫描隧道显微镜(STM)研究了天然单晶矿物2H-MoS2(0001)表面的纳米级表面缺陷。两种主要类型的纳米级缺陷,表示为B和D,在超高真空和环境环境中,在新脱落的表面以及在故意积碳的表面上都普遍存在。所有这些观察结果都排除了与外部吸附有关的来源,而表明与碳有关的大块来源。B缺陷表现出明显的偏置依赖对比度反转,在负偏置处表现为明亮的突出,在正偏置处表现为黑暗的凹陷。相反,D缺陷在整个偏置范围内始终表现为暗凹陷。随着时间的推移,缺陷种群逐渐增加,支持碳物种的内在体积水库。此外,在STM扫描中观察到B和D缺陷之间的可逆相互转化,表明它们来自相同的缺陷种类,具有相似的吸附构型和相似的能量。这些结果确定了碳杂质是二硫化钼上最普遍的纳米级表面缺陷的来源,并为解释其STM对比和演化建立了一致的框架。
{"title":"Carbon-related nanometer-scale defects on MoS2 revealed by scanning tunneling microscopy","authors":"Seungmin Park,&nbsp;Jeongseok Woo,&nbsp;Sangsoo Lee,&nbsp;Geunseop Lee","doi":"10.1007/s40042-026-01634-4","DOIUrl":"10.1007/s40042-026-01634-4","url":null,"abstract":"<div><p>We present a scanning tunneling microscopy (STM) study of nanometer-scale surface defects on the 2H-MoS<sub>2</sub>(0001) surface of a natural single-crystal mineral. Two dominant types of nanometer-scale defects, denoted as B and D, were ubiquitously observed on freshly exfoliated surfaces in both ultra-high vacuum and ambient environments as well as on intentionally carbon-deposited surfaces. All these observations exclude an extrinsic adsorption-related origin and instead suggest a carbon-related bulk source. The B defects exhibit a pronounced bias-dependent contrast reversal, appearing as bright protrusions at negative sample biases and as dark depressions at positive biases. In contrast, the D defects appear consistently as dark depressions over the entire bias range. The defect population increases gradually over time, supporting an intrinsic bulk reservoir of carbon species. In addition, reversible interconversion between the B and D defects is observed during STM scanning, suggesting that they originate from the same defect species occupying closely related adsorption configurations with similar energies. These results identify carbon impurities as the origin of the most prevalent nanometer-scale surface defects on MoS<sub>2</sub> and establish a consistent framework for interpreting their STM contrast and evolution.</p></div>","PeriodicalId":677,"journal":{"name":"Journal of the Korean Physical Society","volume":"89 1","pages":"101 - 109"},"PeriodicalIF":1.0,"publicationDate":"2026-04-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"148261752","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
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Journal of the Korean Physical Society
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