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Resonant Raman Scattering from Quasi-2D Van Hove Excitons in Strain-Engineered Germanium Microstructures 应变工程锗微结构中准二维Van Hove激子的共振拉曼散射
IF 4.7 3区 材料科学 Q1 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2026-10-13 Epub Date: 2026-09-18 DOI: 10.1021/acsaelm.6c01192
Tianrui Wang, Laura Martinez Maestro, Dylan Genuth-Okon, Ross Anthony, Andrew P. Knights, Matthew P Halsall, Iain F Crowe

We present a sub-μm spatial resolution Raman mapping study of strain-engineered germanium (Ge) micro-bridge structures, fabricated on a 220 nm silicon-on-insulator (Ge-SOI). Revision of the analytical geometric-strain model for such structures, to account for partial under-etching, provides good agreement with the uniaxial tensile strain, inferred from Raman peak shifts, over a wide range of geometries. The additional mechanical support, provided by the partial under-etch, leads to improved yield while still achieving a significant degree of up to ∼2.5% strain. We reveal that even relatively small variations in geometry lead to inhomogeneous strain profiles, including regions of locally enhanced strain at points of high radii of curvature. Our observation of a strongly correlated Raman intensity–strain relation is due to the strain-shifted E1 critical point coming into resonance with our 1.96 eV pump laser. A simple model for this provides an estimate of the electron–hole lifetime, τe–h ∼35 fs, and exciton binding energy, Eb ∼15 meV, which are consistent with efficient coupling of the Raman process to quasi-two dimensional (2D) van Hove (vH) excitons in a region of the Ge band structure exhibiting nonparabolicity and a saddle-point topology with a logarithmic joint density of states (JDOS).

我们对应变工程锗(Ge)微桥结构进行了亚μm空间分辨率的拉曼映射研究,该结构在220 nm绝缘体上硅(Ge- soi)上制造。修正这种结构的解析几何应变模型,以解释部分欠蚀刻,提供了与单轴拉伸应变的良好一致性,从拉曼峰位移推断,在广泛的几何形状范围内。由部分蚀刻下提供的额外机械支撑可以提高成品率,同时仍然可以实现高达2.5%的应变。我们发现,即使是相对较小的几何变化也会导致不均匀的应变分布,包括在高曲率半径点的局部增强应变区域。我们观察到一个强相关的拉曼强度-应变关系是由于应变位移E1临界点与我们的1.96 eV泵浦激光器发生共振。一个简单的模型提供了电子-空穴寿命τe-h ~ 35fs和激子结合能Eb ~ 15mev的估计,这与拉曼过程与准二维(2D)范霍夫(vH)激子在Ge带结构区域的有效耦合一致,该区域具有非抛物线性和具有对数联合态密度(JDOS)的鞍点拓扑结构。
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引用次数: 0
Vertical Compressive Stress in Fab-Integrated WS2 FETs: An In Situ Electrical and Nanoindentation-Based Study 晶圆片集成WS2场效应管的垂直压应力:基于原位电和纳米压痕的研究
IF 4.7 3区 材料科学 Q1 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2026-10-13 Epub Date: 2026-09-18 DOI: 10.1021/acsaelm.6c00701
Kavita Vishwakarma, Mario Gonzalez, Quentin Smets, Luca Panarella, Fateme Yekefalah, Tom Schram, Oguzhan Orkut Okudur, Ben Kaczer

Two-dimensional (2D) semiconductors are sensitive to mechanical stress due to their atomic thickness, weak van der Waals interfaces, and ultra-high sensitivity to the surrounding dielectric environment. While the effects of in-plane strain in transition-metal dichalcogenides (TMDs) have been extensively studied, the influence of locally generated out-of-plane compressive stress—commonly introduced during fabrication, packaging, and 3D integration—remains largely unexplored. Here, we apply controlled GPa-level perpendicular stress to monolayer WS2 field-effect transistors (FETs) using a nanoindenter integrated with in situ electrical measurements. Vertical compression reduces the on-state current by up to ∼74.2%, with partial recovery after unloading. Finite element modeling and electro-mechanical TCAD simulations indicate that mobility degradation is dominated by stress-induced enhancement of WS2–oxide interfacial coupling rather than intrinsic band-structure modification. Photoluminescence and Raman spectroscopy reveal that the WS2 lattice remains intact and show ∼0.5% relaxation of intrinsic tensile strain. These results establish a quantitative framework for understanding vertical-stress-driven transport degradation and highlight out-of-plane compression as an emerging reliability challenge for 2D materials in future stacked and heterogeneous device architectures.

二维(2D)半导体由于其原子厚度、弱范德华界面和对周围介电环境的超高灵敏度而对机械应力敏感。虽然平面内应变对过渡金属二硫化物(TMDs)的影响已经得到了广泛的研究,但局部产生的平面外压应力(通常在制造、封装和3D集成过程中引入)的影响仍然很大程度上未被探索。在这里,我们使用集成了原位电测量的纳米压头对单层WS2场效应晶体管(fet)施加受控的gpa级垂直应力。垂直压缩可使导通电流降低高达74.2%,卸载后可部分恢复。有限元建模和机电TCAD仿真表明,应力诱导的ws2 -氧化物界面耦合增强主导了迁移率的降低,而不是固有的能带结构改变。光致发光和拉曼光谱显示WS2晶格保持完整,并显示出约0.5%的本征拉伸应变弛豫。这些结果为理解垂直应力驱动的输运退化建立了定量框架,并强调了平面外压缩是未来堆叠和异构器件架构中二维材料可靠性的新挑战。
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引用次数: 0
A Dual-Tube Actuated POF Sensor with Double End-Face Misalignment for Mattress-Embedded Respiratory Monitoring and Abnormal Pattern Recognition 用于床垫呼吸监测和异常模式识别的双管驱动双端面错位POF传感器
IF 4.7 3区 材料科学 Q1 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2026-10-13 Epub Date: 2026-09-21 DOI: 10.1021/acsaelm.6c01717
Hao-Yi Zheng, Shuo Liu, Ming-Yang Chen, Xiao-Fang Xu, Ying Liang, Tian-Yi Gong

This paper presents a dual-tube actuated plastic optical fiber (POF) end-face coupling sensor integrated into a dual-channel mattress for non-invasive monitoring of thoracic and abdominal respiratory motions. The sensing unit employs a three-segment fiber architecture within a nested tube assembly: the middle POF segment is embedded in a flexible inner tube, while the input and output fibers are inserted into the ends of this inner tube with well-defined gaps from the middle fiber’s end faces. This inner assembly is further sheathed in a rigid outer tube. When subjected to cyclic compression from human respiration, the rigid outer tube bears the pressure and drives the middle segment to undergo overall vertical displacement, while the input/output fibers remain stationary. This induces simultaneous lateral misalignment at both end-face pairs (input–middle and middle–output), which magnifies the change in optical coupling efficiency and results in enhanced output intensity variations with signal stability. The transmission loss of the sensor exhibited good linearity with applied force over the range of 0–8 N, yielding R2 = 0.9824 and a sensitivity of 1.362 dB/N. In dynamic tests with simulated respiratory signals, real-time extraction of respiratory rate and amplitude using a peak detection algorithm gave maximum relative errors of 2.6% and 5.2%, respectively. After integration into the mattress, the system was evaluated in a human-subject experiment during respiratory measurements. The thoracic and abdominal channels showed high measurement accuracy, close agreement with a reference respiratory belt, and robust signal quality. Furthermore, several simulated abnormal respiratory states were recorded, and the acquired waveforms captured key features of these abnormal respiratory patterns. These results demonstrate that the proposed mattress can provide respiratory rate, amplitude, and thoracoabdominal phase difference data, offering multidimensional parameters for the assessment of abnormal respiratory patterns.

本文提出了一种集成在双通道床垫中的双管驱动塑料光纤(POF)端面耦合传感器,用于无创监测胸部和腹部呼吸运动。传感单元采用嵌套管组件内的三段光纤结构:中间的POF段嵌入柔性内管中,而输入和输出光纤插入内管的两端,中间光纤的端面有明确的间隙。这个内部组件进一步被套在一个刚性的外管中。当受到人体呼吸循环压缩时,刚性外管承受压力并驱动中间部分发生整体垂直位移,而输入/输出纤维保持静止。这导致两个端面对(输入-中间和中输出)同时发生横向错位,从而放大了光耦合效率的变化,并导致输出强度随信号稳定性的变化增强。在0-8 N范围内,传感器的传输损耗与施加的力呈良好的线性关系,R2 = 0.9824,灵敏度为1.362 dB/N。在模拟呼吸信号的动态测试中,使用峰值检测算法实时提取呼吸频率和幅度,最大相对误差分别为2.6%和5.2%。在集成到床垫后,该系统在呼吸测量期间在人体受试者实验中进行评估。胸腹通道测量精度高,与参考呼吸带接近,信号质量稳定。此外,还记录了几种模拟的异常呼吸状态,所获得的波形捕获了这些异常呼吸模式的关键特征。这些结果表明,所提出的床垫可以提供呼吸频率、幅度和胸腹相位差数据,为评估异常呼吸模式提供多维参数。
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引用次数: 0
Flexible and Anti-freezing Cu@Fe3O4-PANI/Polyvinyl Alcohol/Phytic Acid/LiCl Hydrogel Electrolytes in High-Performance All-Solid-State Supercapacitors 柔性和抗冻Cu@Fe3O4-PANI/聚乙烯醇/植酸/LiCl水凝胶电解质在高性能全固态超级电容器
IF 4.7 3区 材料科学 Q1 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2026-10-13 Epub Date: 2026-09-19 DOI: 10.1021/acsaelm.6c01645
Junjie Liu, Jie Hu, Fengshuo He, Qiqi Yang, Fangya Zhang, Qiyang Wang, Manqing Yan

The widespread adoption of flexible electronics has driven the development of all-solid-state energy storage materials. However, the limited single-functionality and unsatisfactory low-temperature tolerance of conventional hydrogel electrolytes remain critical challenges for wearable applications. Thus, a Cu@Fe3O4-PANI/PVA/PA/LiCl (CPPALi) hydrogel was fabricated via a freeze–thaw approach. Through hydrogen bonding, physical cross-linking, and electrostatic interactions, the one-pot incorporation of PA, Cu@Fe3O4-PANI (CFP) hybrids, and LiCl significantly enhanced the conductivity, water retention, and adhesion, and anti-freezing performance. The above as-obtained CPPALi0.6 hydrogel strain sensor exhibited linear strain sensing characteristics (GF = 1.95) for human motion monitoring with high conductivity (2.74 S m–1) and outstanding freeze resistance (–47 °C) and good water retention capacity. The all-solid-state CPPALi0.6 supercapacitor devices were assembled with CPPALi0.6 hydrogel as electrolyte and activated carbon as electrodes. Importantly, they delivered a specific capacitance of 310.8 mF cm–2 at 1 mA cm–2, achieved an energy density of 45.6 μWh cm–2 at a power density of 255.1 μW cm–2, and retained stable electrochemical stability even at –30 °C. Series-connected CPPALi0.6 supercapacitor devices could power a light bulb and drive a timer for 60 min. After 3000 charge–discharge cycles, the capacitance retention remained as high as 94.4%, and the performance remained stable after 21 days. Thus, this multifunctional hydrogel integrates structural stability, adhesion, anti-freezing, energy storage, and sensing functionalities, demonstrating significant potential in the field of wearable all-solid-state electronic devices.

柔性电子器件的广泛应用推动了全固态储能材料的发展。然而,传统水凝胶电解质有限的单一功能和不理想的低温耐受性仍然是可穿戴应用的关键挑战。通过冻融法制备Cu@Fe3O4-PANI/PVA/PA/LiCl (CPPALi)水凝胶。通过氢键、物理交联和静电相互作用,PA、Cu@Fe3O4-PANI (CFP)杂化体和LiCl在一锅中掺入显著提高了导电性能、保水性能、附着力和防冻性能。所得CPPALi0.6水凝胶应变传感器具有线性应变传感特性(GF = 1.95),具有高电导率(2.74 S m-1)、优异的抗冻性(-47°C)和良好的保水性,适合人体运动监测。以CPPALi0.6水凝胶为电解质,活性炭为电极,组装了全固态CPPALi0.6超级电容器器件。重要的是,它们在1ma cm-2时提供了310.8 mF cm-2的比电容,在255.1 μW cm-2的功率密度下实现了45.6 μWh cm-2的能量密度,并且即使在-30°C下也保持了稳定的电化学稳定性。串联的CPPALi0.6超级电容器件可以为灯泡供电并驱动计时器60分钟。经过3000次充放电循环后,电容保持率高达94.4%,21天后性能保持稳定。因此,这种多功能水凝胶集结构稳定性、粘附性、防冻性、能量储存和传感功能于一体,在可穿戴全固态电子设备领域显示出巨大的潜力。
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引用次数: 0
Printed Devices with MXene Active Layers and Their Applications MXene有源层印刷器件及其应用
IF 4.7 3区 材料科学 Q1 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2026-10-13 Epub Date: 2026-09-26 DOI: 10.1021/acsaelm.6c01161
Ajay Pratap, Tony Valayil Varghese, M. Meyyappan, David Estrada

MXenes have demonstrated strong potential across a wide range of applications due to their outstanding properties, evidenced by the impressive performance of MXene-based devices reported to date. As the field moves toward commercialization, identifying methods and technologies compatible with scalable manufacturing has become increasingly important. In this context, direct-write printing has emerged as a transformative approach in printed and flexible electronics because it enables the deposition of functional metallic, semiconducting, and dielectric films with controlled thickness from tailored inks. Printing is also cost-effective because it simplifies processing and reduces infrastructure and logistical requirements. Printing is especially attractive for wearable devices because it can produce thin films on both rigid and flexible substrates. Although researchers have prepared MXene active layers using a wide variety of techniques, direct-write printing has shown considerable promise in recent studies. This spotlight article highlights recent advances in MXene applications in energy storage and harvesting, electromagnetic interference shielding, and antennas, along with background on ink formulation and thin-film fabrication using common printing methods.

由于其出色的性能,MXenes在广泛的应用中展示了强大的潜力,迄今为止基于MXenes的设备的令人印象深刻的性能证明了这一点。随着该领域走向商业化,确定与可扩展制造兼容的方法和技术变得越来越重要。在这种情况下,直写印刷已经成为印刷和柔性电子领域的一种变革性方法,因为它可以通过定制墨水沉积具有控制厚度的功能金属、半导体和介电薄膜。印刷也具有成本效益,因为它简化了处理过程,减少了基础设施和物流要求。印刷技术对于可穿戴设备尤其具有吸引力,因为它可以在刚性和柔性基板上生产薄膜。尽管研究人员已经使用各种各样的技术制备了MXene活性层,但在最近的研究中,直写打印显示出相当大的前景。本文重点介绍了MXene在能量存储和收集、电磁干扰屏蔽和天线方面的最新应用进展,以及油墨配方和使用常见印刷方法制作薄膜的背景。
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引用次数: 0
Beyond SiO2: A Review of Advanced High Dielectric Constant Passivation Layers for 4H-SiC Metal-Oxide-Semiconductor Devices 超越SiO2:用于4H-SiC金属氧化物半导体器件的先进高介电常数钝化层综述
IF 4.7 3区 材料科学 Q1 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2026-10-13 Epub Date: 2026-09-21 DOI: 10.1021/acsaelm.6c01054
Junchen Deng, Hock Jin Quah

The relentless pursuit of higher efficiency, power density, and temperature capability in power electronics has positioned 4H-silicon carbide (4H-SiC) as a cornerstone semiconductor for next-generation devices. While the existence of a native SiO2 layer had facilitated the development of 4H-SiC metal-oxide-semiconductor (MOS) technology, this insulator was ultimately identified as a constraint on its ultimate performance. The significant dielectric constant (k) mismatch between SiO2 (k = 3.9) and 4H-SiC (k = 9.7) results in a much higher electric field within the oxide, thereby limiting the full exploitation of the high critical field of 4H-SiC. Furthermore, the inherently high interface trap density (Dit) at the SiO2/SiC interface severely degraded channel mobility and device reliability. This review comprehensively charted the trajectory of advanced high-k passivation layers designed to surmount these fundamental limitations. This review presented a critical assessment of a wide spectrum of alternative dielectrics, including Al2O3, AlN, HfO2, ZrO2, and rare-earth oxides, based on stringent criteria such as band alignment, thermodynamic stability, and interface quality. The pivotal role of post-deposition annealing in passivating interface states and modulating electrical properties was thoroughly examined. By synthesizing the current state of the art and highlighting emerging materials and interface engineering strategies, this review provided a roadmap for the development of robust high-k dielectrics on 4H-SiC, which is crucial for unlocking the full potential of ultra-high-voltage, high-temperature, and radiation-hardened power devices.

在电力电子领域,对更高效率、功率密度和温度性能的不懈追求使4h -碳化硅(4H-SiC)成为下一代器件的基石半导体。虽然天然SiO2层的存在促进了4H-SiC金属氧化物半导体(MOS)技术的发展,但这种绝缘体最终被认为是其最终性能的限制因素。SiO2 (k = 3.9)和4H-SiC (k = 9.7)之间的介电常数(k)明显不匹配,导致氧化物内电场高得多,从而限制了4H-SiC高临界电场的充分利用。此外,SiO2/SiC界面上固有的高界面陷阱密度(Dit)严重降低了通道迁移率和器件可靠性。这篇综述全面描绘了旨在克服这些基本限制的先进高钾钝化层的发展轨迹。这篇综述基于严格的标准,如能带对准、热力学稳定性和界面质量,对广泛的替代电介质,包括Al2O3、AlN、HfO2、ZrO2和稀土氧化物进行了关键评估。研究了沉积后退火在钝化界面状态和调制电性能中的关键作用。通过综合当前最先进的技术,突出新兴材料和界面工程策略,本综述为在4H-SiC上开发坚固的高k介电材料提供了路线图,这对于释放超高压、高温和抗辐射功率器件的全部潜力至关重要。
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引用次数: 0
Influence of RF Sputtering Temperature on Defects, Transport, and UV-C Photodetection of a-Ga2O3 射频溅射温度对a-Ga2O3缺陷、输运和UV-C光检测的影响
IF 4.7 3区 材料科学 Q1 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2026-10-13 Epub Date: 2026-09-25 DOI: 10.1021/acsaelm.6c01181
Anh P. Ho, Phuong Y. Le, Sidhant Sharma, Martin W. Allen, James G. Partridge, Hiep N. Tran

The photodetection capabilities of RF sputtered amorphous thin-film gallium oxide have been studied as a function of their growth temperature. Specifically, X-ray photoelectron spectroscopy (XPS) and dark/UV-C illuminated temperature-dependent current–voltage measurements were used to reveal the relationships among growth temperature, stoichiometry, and photoresponse characteristics. XPS O 1s analysis revealed that an optimum growth temperature of 600 °C yielded the lowest concentration of oxygen vacancies. Devices on this film exhibited the best overall photosensitivity to 254 nm UV-C light, with the highest responsivity (R = 13 A/W) and specific detectivity (D* = 3.7 × 1013 Jones) alongside fast transient response times (τr ∼ 0.51 s, τd ∼ 0.16 s). Lower growth temperatures resulted in films that exhibited increased persistent photoconductivity and proved thermally unstable, failing to recover their original characteristics after heating to 200 °C. Increasing the growth temperature above 600 °C caused increased oxygen deficiency in the films when compared with films grown at 600 °C, likely due to increased out-diffusion of oxygen during deposition. These findings demonstrate that cost-effective, scalable RF sputtering at an optimized growth temperature can produce amorphous gallium oxide with comparable UV-C sensitivity to that achieved with more complex deposition methods.

研究了射频溅射非晶氧化镓薄膜的光探测能力与生长温度的关系。具体来说,利用x射线光电子能谱(XPS)和暗/UV-C照明温度相关的电流-电压测量来揭示生长温度、化学计量和光响应特性之间的关系。XPS O - 1s分析表明,在600℃的最佳生长温度下,氧空位浓度最低。该薄膜上的器件在254 nm UV-C光下表现出最佳的总光敏性,具有最高的响应率(R = 13 A/W)和比探测率(D* = 3.7 × 1013 Jones)以及快速的瞬态响应时间(τr ~ 0.51 s, τd ~ 0.16 s)。较低的生长温度导致薄膜表现出持续增加的光导电性,并且被证明是热不稳定的,在加热到200°C后未能恢复其原始特性。与在600℃下生长的薄膜相比,将生长温度提高到600℃以上会导致薄膜缺氧程度增加,这可能是由于沉积过程中氧气向外扩散的增加。这些发现表明,在优化的生长温度下,具有成本效益,可扩展的射频溅射可以产生具有与更复杂沉积方法相当的UV-C灵敏度的非晶氧化镓。
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引用次数: 0
Irradiation-Induced Optical Memory for Neuromorphic Synaptic Applications 辐射诱导光记忆在神经形态突触中的应用
IF 4.7 3区 材料科学 Q1 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2026-10-13 Epub Date: 2026-09-24 DOI: 10.1021/acsaelm.6c01230
Mingxi Liu, Jiali Wu, Xuening Fan, Na Yan, Danyang Wang, Bingcheng Luo

Ion irradiation offers a generalizable route for engineering functional materials through defect formation. Here, we demonstrate robust optical memory in GaScN thin films enabled by low-energy Ar+ ion irradiation. The irradiation-induced defect states give rise to persistent photoconductivity and support a range of brain-inspired functionalities, including synaptic plasticity, activity-dependent memory transition, and higher-order learning. The cumulative photoresponse further enables optoelectronic logic operations, including AND and OR Boolean functions. These results establish ion irradiation as an effective strategy for realizing optical memory in nitrides, providing a versatile platform for programmable neuromorphic optoelectronics.

离子辐照通过缺陷形成为工程功能材料提供了一条可推广的途径。在这里,我们展示了低能Ar+离子辐照使GaScN薄膜具有强大的光存储能力。辐照诱导的缺陷状态会产生持续的光电导率,并支持一系列大脑激发的功能,包括突触可塑性、活动依赖性记忆转换和高阶学习。累积光响应进一步实现光电逻辑运算,包括AND和OR布尔函数。这些结果表明离子辐照是实现氮化物光存储的有效策略,为可编程神经形态光电子学提供了一个通用的平台。
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引用次数: 0
On the Way to the Location-Selective Replacement of Self-Assembled Monolayers: An Electrochemical Approach 自组装单层膜的位置选择性替代:电化学方法
IF 4.7 3区 材料科学 Q1 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2026-10-13 Epub Date: 2026-09-21 DOI: 10.1021/acsaelm.6c01647
Franziska Kramer, Michael Gärtner, Michael Zharnikov, Andreas Terfort

Location-selective engineering of chemically identical areas of a complex substrate by the deposition of several different self-assembled monolayers (SAMs) represents a challenge of interfacial nanotechnology. These areas cannot be distinguished by tailoring the anchoring group of the different SAM-forming molecules, since this group, dictated by surface chemistry, should be the same for all these molecules. However, as shown in the present study, such engineering can be potentially performed electrochemically, by the successive assembly of one of the SAMs on all the areas, its controlled removal from selected areas by applying a system-specific reductive desorption potential, and the deposition of the second SAM onto these areas, while the first SAM is preserved in all other regions. The approach was tested with individual samples and several aromatic SAM-forming molecules with either thiolate or selenolate anchoring to the substrate (Au). It worked well for most combinations of these molecules, which provides a reliable basis for its extension to real-life heterogeneous templates, such as circuit boards hosting different types of organic transistors, requiring type-specific interface engineering.

通过沉积几种不同的自组装单层(SAMs)来选择复杂衬底化学相同区域的位置工程是界面纳米技术的一个挑战。这些区域不能通过剪裁不同的sam形成分子的锚定基团来区分,因为这个由表面化学决定的基团对于所有这些分子来说应该是相同的。然而,正如本研究所示,这种工程可以通过电化学方法进行,通过在所有区域连续组装一个SAM,通过应用系统特异性还原解吸电位将其从选定区域控制去除,然后将第二个SAM沉积到这些区域,而第一个SAM保留在所有其他区域。该方法用单个样品和几种芳香sam形成分子进行了测试,这些分子要么是硫代酸盐,要么是硒代酸盐锚定在底物(Au)上。它对这些分子的大多数组合都很有效,这为其扩展到现实生活中的异质模板提供了可靠的基础,例如承载不同类型有机晶体管的电路板,需要特定类型的接口工程。
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引用次数: 0
Interfacially Self-Assembled Ti3C2Tx Conductive Scaffolds for Enhanced Electrochromic Performance of WO3 Nanoparticle Films 界面自组装Ti3C2Tx导电支架增强WO3纳米颗粒薄膜电致变色性能
IF 4.7 3区 材料科学 Q1 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2026-10-13 Epub Date: 2026-09-22 DOI: 10.1021/acsaelm.6c01554
Xiaoxin Hou, Xiaoqin Wang, Juan Wu, Chunxia Hua, Jia Chu, Ming Gong, Runlan Zhang, Shanxin Xiong

Tungsten oxide (WO3) is a promising electrochromic (EC) material, yet its low electrical conductivity and sluggish ion-transport limit its switching kinetics and cycling stability. Herein, we construct a hierarchical two-dimensional/zero-dimensional (2D/0D) Ti3C2Tx MXene/WO3 composite film via interfacial self-assembly and electrochemical deposition. Interconnected Ti3C2Tx nanosheets serve as a conductive scaffold, and their excellent electrical conductivity significantly reduces the charge transport barrier, while uniformly distributed WO3 nanoparticles (≈65 nm) provide abundant electroactive interfaces and shortened ion-transport pathways. By optimizing the tungsten-ion concentration, deposition voltage, and deposition time, the Ti3C2Tx/WO3 composite film exhibits an optical modulation of 50.93% at 600 nm, with coloration and bleaching times of 12.06 and 13.29 s, respectively. The film retains 98.15% of its initial optical modulation after 1200 s of continuous cycling, compared with 58.41% for neat WO3. These improvements originate from the synergistic effect of Ti3C2Tx and WO3. Ti3C2Tx facilitates charge transport, whereas nanoscale WO3 enhances electrolyte accessibility and facilitates ion diffusion, collectively accelerating the electrochemical reaction kinetics. This work establishes a rational 2D/0D architecture for coupling rapid electron and ion transport and offers a viable strategy for high-performance electrochromic devices.

氧化钨(WO3)是一种很有前途的电致变色(EC)材料,但其低电导率和缓慢的离子输运限制了其开关动力学和循环稳定性。在此,我们通过界面自组装和电化学沉积构建了二维/零维(2D/0D) Ti3C2Tx MXene/WO3复合薄膜。互连的Ti3C2Tx纳米片作为导电支架,其优异的导电性显著降低了电荷输运屏障,而均匀分布的WO3纳米颗粒(≈65 nm)提供了丰富的电活性界面和缩短的离子输运途径。通过对钨离子浓度、沉积电压和沉积时间的优化,Ti3C2Tx/WO3复合薄膜在600 nm处的光调制率为50.93%,着色时间为12.06 s,漂白时间为13.29 s。连续循环1200 s后,薄膜保留了98.15%的初始光调制,而纯WO3薄膜保留了58.41%的初始光调制。这些改进源于Ti3C2Tx和WO3的协同作用。Ti3C2Tx有利于电荷输运,而纳米WO3提高了电解质的可及性,促进了离子的扩散,共同加速了电化学反应动力学。本工作建立了一个合理的二维/零位结构,用于耦合快速电子和离子输运,为高性能电致变色器件提供了可行的策略。
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ACS Applied Electronic Materials
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